Tetrylammonium

Tetrylammonium

SCHEMBL27466285

CCCCS(=O)(=O)O.CC[N+](CC)(CC)CC

nearest known ligand 0.42

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.42
EPHX2 P34913 1/20 0.40
TSHR P16473 2/20 0.38
NFKB1 P19838 1/20 0.38
KCNA1 Q09470 1/20 0.38
LMNA P02545 3/20 0.38
TP53 P04637 2/20 0.38
ALDH1A1 P00352 2/20 0.38
NPC1 O15118 1/20 0.38
S1PR2 O95136 1/20 0.38
S1PR4 O95977 1/20 0.38
POLB P06746 1/20 0.38
MAPT P10636 1/20 0.38
HPGD P15428 1/20 0.38
XBP1 P17861 1/20 0.38
S1PR1 P21453 1/20 0.38
MAPK1 P28482 1/20 0.38
AGTR1 P30556 1/20 0.38
HTT P42858 1/20 0.38
RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrylammonium SCHEMBL28179194 0.98 APP (0.41) APPEPHX2TSHRNFKB1KCNA1
Tetrylammonium SCHEMBL28179119 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Tetrylammonium SCHEMBL28178177 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Tetrylammonium SCHEMBL9710111 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Tetrylammonium SCHEMBL10416293 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Tetrylammonium SCHEMBL28178215 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Tetrylammonium SCHEMBL28851555 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Tetrylammonium SCHEMBL10418239 0.91 EPHX2 (0.49) APPEPHX2DNM1FAAHCA1
Hydrogen Sulfide SCHEMBL27914408 0.90
Tetrylammonium SCHEMBL28155780 0.89 EPHX2 (0.47) APPEPHX2DNM1FAAHCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108693705-A Resist lower layer membrane material, pattern forming method and resist lower membrane forming method 信越化学工业株式会社 2018-10-23 CN disclosed
CN-108693713-A Resist lower layer membrane material, pattern forming method and resist lower membrane forming method 信越化学工业株式会社 2018-10-23 CN disclosed
CN-107209146-A electrochemical gas sensor and electrolyte for electrochemical gas sensor 德尔格安全股份两合公司 2017-09-26 CN disclosed
CN-103314054-A Compositions and articles of manufacture comprising siloxanes SABIC INNOVATIVE PLASTICS IP 2013-09-18 CN disclosed
CN-1518497-A Multilayer system containing anti-static moulding materials 2004-08-04 CN disclosed
CN-1152913-C Antistatic agent 2004-06-09 CN disclosed
CN-1370200-A Antistatic agent BAYER AG (DE) 2002-09-18 CN disclosed