SCHEMBL2747110

SCHEMBL2747110

C#Cc1c(C23CC4CC(CC(C4)C2)C3)ccc(-c2ccc(C34CC5CC(CC(C5)C3)C4)cc2C(=O)O)c1C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SERPINE1 P05121 2/20 0.40
KMT2A Q03164 5/20 0.37
MEN1 O00255 4/20 0.37
POLB P06746 1/20 0.37
GAA P10253 1/20 0.37
GFER P55789 1/20 0.37
HIF1A Q16665 2/20 0.34
EPAS1 Q99814 1/20 0.34
RARG P13631 5/20 0.34
RARB P10826 4/20 0.34
RARA P10276 4/20 0.34
NPC1 O15118 1/20 0.34
IKBKB O14920 1/20 0.34
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27716784 0.82 RARG (0.37) SERPINE1KMT2AMEN1HIF1AEPAS1
Hydrochloric Acid SCHEMBL5000857 0.78 RARG (0.36) SERPINE1KMT2AMEN1HIF1AEPAS1
Hydrochloric Acid SCHEMBL5000860 0.75 SERPINE1 (0.41) SERPINE1KMT2AMEN1POLBGAA
SCHEMBL27780757 0.73 NPC1 (0.40) SERPINE1KMT2AMEN1HIF1AEPAS1
SCHEMBL28289972 0.72 KMT2A (0.54) SERPINE1KMT2AMEN1POLBGAA
SCHEMBL2708378 0.70 SERPINE1 (0.45) SERPINE1KMT2AMEN1POLBGAA
SCHEMBL13856790 0.70 MEN1 (0.65) SERPINE1KMT2AMEN1POLBGAA
SCHEMBL28775611 0.69 KMT2A (0.42) SERPINE1KMT2AMEN1POLBGAA
SCHEMBL8132446 0.69 NPC1 (0.41) SERPINE1KMT2AMEN1POLBGAA
SCHEMBL8320658 0.68 RARB (0.52) KMT2AMEN1RARGRARBRARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed