SCHEMBL27489

SCHEMBL27489

ClC(Br)C(Br)(Br)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL928602 0.76
SCHEMBL2110089 0.76
SCHEMBL2110088 0.74
SCHEMBL11655080 0.73
SCHEMBL10668689 0.70
SCHEMBL8066982 0.70
SCHEMBL11118126 0.70
SCHEMBL8066980 0.70
Dibromochloromethane SCHEMBL11344575 0.70
SCHEMBL2746209 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005876-B2 Positive photosensitive resin composition for spray coating and method for producing through electrode using the same SUMITOMO BAKELITE CO., LTD. (JP) 2015-04-14 US disclosed
US-20140113448-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2014-04-24 US disclosed
EP-2639638-A1 Positive photosensitive resin composition, and semiconductor device and display therewith Sumitomo Bakelite Co., Ltd. (JP) 2013-09-18 EP disclosed
US-20110200937-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2011-08-18 US disclosed
EP-2345933-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING SAME Sumitomo Bakelite Co., Ltd. (JP) 2011-07-20 EP disclosed
US-20100193971-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING, METHOD FOR FORMING CURED FILM USING THE SAME, CURED FILM, AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE COMPANY LIMITED (JP) 2010-08-05 US disclosed
EP-2175319-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING, METHOD FOR FORMING CURED FILM USING THE SAME, CURED FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company Limited (JP) 2010-04-14 EP disclosed
US-20090166818-A1 Positive Photosensitive Resin Composition, and Semiconductor Device and Display Therewith SUMITOMO BAKELITE COMPANY LIMITED (JP) 2009-07-02 US disclosed
EP-1965256-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE AND DISPLAY USING SAME SUMITOMO BAKELITE CO., LTD. (JP) 2008-09-03 EP disclosed
EP-0906588-B1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS GOODRICH CO B F (US) 2002-03-27 EP disclosed
US-6121340-A MIXTURE CONTAINING PHOTOINITIATOR THE B. F. GOODRICH COMPANY (US) 2000-09-19 US disclosed
US-6017681-A EDGE JOINING OPTICAL PARTS BY APPLYING PHOTOSENSITIVE ADHESIVE TO SEPARATE EDGES AND IRRADIATING TO FORM WAVEGUIDES, THEN MATING EDGES AND HEATING TO MELT AND FUSE WAVEGUIDE MATERIAL FUJITSU LIMITED (JP) 2000-01-25 US disclosed
US-5902715-A FORMING A MIRROR-FINISHED SURFACE AT A BOUNDARY BETWEEN A AN IRRADIATED AND A NON-IRRADIATED WAVEGUIDE BY OBLIQUELY IRRADIATING THE WAVEGUIDE; REFRACTIVE INDEX MAY BE INCREASED BY HEATING IRRADIATED PORTION, OR WITH A CATALYZER FUJITSU LIMITED (JP) 1999-05-11 US disclosed
EP-0906588-A1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS THE B.F. GOODRICH COMPANY (US) 1999-04-07 EP disclosed
WO-1998020394-A1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS THE B.F. GOODRICH COMPANY (US) 1998-05-14 WO disclosed
US-5025051-A Perchloric acid; piperidyl compound, fire retardant; light and heat resistant FERRO CORPORATION (US) 1991-06-18 US disclosed
EP-0344321-A1 SYNTHETIC RESIN COMPOSITION FERRO CORPORATION (US) 1989-12-06 EP disclosed