⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27548978 | 0.69 | — | — | |
| SCHEMBL23490974 | 0.63 | — | — | |
| SCHEMBL15328816 | 0.62 | — | — | |
| SCHEMBL27628412 | 0.61 | — | — | |
| SCHEMBL14562630 | 0.59 | — | — | |
| SCHEMBL28571388 | 0.57 | — | — | |
| SCHEMBL18745661 | 0.56 | — | — | |
| SCHEMBL13156410 | 0.56 | — | — | |
| SCHEMBL29205011 | 0.56 | — | — | |
| Water SCHEMBL31012143 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108516542-B | Preparation method of high-fluorine-content nano fluorinated graphene | 厦门中科希弗科技有限公司 | 2022-06-14 | — | — | CN | claimed |
| CN-108516542-B | Preparation method of high-fluorine-content nano fluorinated graphene | 厦门中科希弗科技有限公司 | 2022-06-14 | — | — | CN | disclosed |
| CN-103228739-B | Azo dye | 凯米拉公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-103237847-B | Azoic dyestuff | KEMIRA OY (FI) | 2016-03-16 | — | — | CN | disclosed |
| CN-103228738-B | Azoic dyestuff | KEMIRA OY (FI) | 2016-01-27 | — | — | CN | disclosed |
| CN-103237847-A | Azo dyes | KEMIRA OYJ | 2013-08-07 | — | — | CN | disclosed |
| CN-103228738-A | Azo dyes | KEMIRA OYJ | 2013-07-31 | — | — | CN | disclosed |
| CN-103228739-A | Azo dyes | KEMIRA OYJ | 2013-07-31 | — | — | CN | disclosed |
| CN-101007909-B | Macromolecule dye and its preparation and purification method, ink-jet ink using the dye | WUHAN HAITUTE ADVANCED MATERIALS CO LTD | 2010-05-19 | — | — | CN | disclosed |
| CN-100577752-C | Liquid ink set for ink jet printing machine | HEWLETT PACKARD DEVELOPMENT CO | 2010-01-06 | — | — | CN | disclosed |
| CN-100349995-C | Alkali ink composite | KEWLETT PACKARAD CO (US) | 2007-11-21 | — | — | CN | disclosed |
| CN-101007909-A | Macromolecule dye and its preparation and purification method, ink-jet ink using the dye | WUHAN HAITUTE ADVANCED MATERIA (CN) | 2007-08-01 | — | — | CN | disclosed |
| CN-1475537-A | Liquid formulation for ink jet printing machine | 惠普公司 | 2004-02-18 | — | — | CN | disclosed |
| CN-1246502-A | Alkali ink composite | KEWLETT PACKARAD CO (US) | 2000-03-08 | — | — | CN | disclosed |
| CN-1210544-A | Photosensitive resin composition and articles | NIPPON KAYAKU KK (JP) | 1999-03-10 | — | — | CN | disclosed |