SCHEMBL27505337

SCHEMBL27505337

CCCCS(=O)(=O)O.[Ag]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL27460461 0.97 APP (0.48) —
SCHEMBL10012319 0.97 — —
SCHEMBL5015 0.97 — —
SCHEMBL31512497 0.97 — —
SCHEMBL59926 0.94 — —
Hydrochloric Acid SCHEMBL2380738 0.94 — —
Butane SCHEMBL21052118 0.94 APP (0.50) —
SCHEMBL21859086 0.94 — —
SCHEMBL1786796 0.94 — —
Bromide SCHEMBL11745564 0.94 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105131041-B A kind of catalytic applications in novel triphenyl organo-bismuth (V) composition catalyst and preparation method thereof and nitrogenous compound synthesis 湖南大学 2018-10-09 — — CN claimed
CN-105131041-A Novel triphenyl organic bismuth (V) complex catalyst, preparation method thereof, and catalysis application thereof in nitrogen-containing compounds UNIV HUNAN 2015-12-09 — — CN claimed
CN-104529725-A Method for synthesizing ketone through catalyzing and hydrolyzing alkyne with silver perfluorooctanesulfonate UNIV HUNAN 2015-04-22 — — CN claimed
CN-107790186-A A kind of new decamethyl Zirconocenes and its preparation method and application 山西医科大学 2018-03-13 — — CN disclosed
CN-107722049-A A kind of preparation and its application of novel ionic double-core schiff bases titanium complex 山西医科大学 2018-02-23 — — CN disclosed
CN-104558056-A Preparation and application of novel isopropyl zirconocene complex UNIV HUNAN 2015-04-29 — — CN disclosed
CN-100578357-C High sensitivity resist composition for electron based lithography IBM 2010-01-06 — — CN disclosed
CN-1836191-A High sensitivity resist compsns for electron based lithography IBM (US) 2006-09-20 — — CN disclosed
CN-1220914-C Chemical reinforcing photoresist structure composition and sulfonium salt SUMITOMO CHEMICAL CO (JP) 2005-09-28 — — CN disclosed
CN-1210624-C Chemical amplifying positive photoresist composition SUMITOMO CHEMICAL CO (JP) 2005-07-13 — — CN disclosed
CN-1207632-C Chemical enhancement type positive photoetching gum composition SUMOTOMO CHEMICAL CO LTD (JP) 2005-06-22 — — CN disclosed
CN-1354392-A Chemical amplifying positive photoresist composition SUMITOMO CHEMICAL CO (JP) 2002-06-19 — — CN disclosed
CN-1322968-A Chemical reinforcing photoresist structure composition and sulfonium salt SUMITOMO CHEMICAL CO (JP) 2001-11-21 — — CN disclosed
CN-1268680-A Chemical enhancement type positive photoetching gum composition SUMOTOMO CHEMICAL CO LTD (JP) 2000-10-04 — — CN disclosed
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