⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Chloromethane SCHEMBL4941267 | 0.78 | — | — | |
| Trimethylammonium SCHEMBL4404280 | 0.78 | — | — | |
| SCHEMBL181526 | 0.78 | — | — | |
| Trimethylammonium SCHEMBL27407369 | 0.74 | — | — | |
| Trimethylammonium SCHEMBL1218437 | 0.74 | — | — | |
| Trimethylammonium SCHEMBL317084 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL28902554 | 0.72 | — | — | |
| Trimethylammonium SCHEMBL27262439 | 0.72 | — | — | |
| SCHEMBL28825085 | 0.72 | — | — | |
| SCHEMBL27328626 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101932630-B | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL CO | 2012-12-05 | — | — | CN | disclosed |
| CN-101472933-B | Hydrolysis resistant organomodified silylated surfactants | MOMENTIVE PERFORMANCE MAT INC | 2012-08-08 | — | — | CN | disclosed |
| CN-102405265-A | Coating and printing ink compositions comprising silylated polyether surfactants and articles made therefrom | MOMENTIVE PERFORMANCE MAT INC | 2012-04-04 | — | — | CN | disclosed |
| CN-101463133-B | Manufacturing method and apparatus of optical material | SEIKO EPSON CORP | 2011-03-02 | — | — | CN | disclosed |
| CN-101175792-B | Curable composition | MITSUBISHI GAS CHEMICAL CO | 2011-01-26 | — | — | CN | disclosed |
| CN-101932630-A | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL CO | 2010-12-29 | — | — | CN | disclosed |
| CN-101472933-A | Hydrolysis resistant organomodified silylated surfactants | MOMENTIVE PERFORMANCE MAT INC (US) | 2009-07-01 | — | — | CN | disclosed |
| CN-101463133-A | Manufacturing method and apparatus of optical material | SEIKO EPSON CORP (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-101175792-A | curable composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2008-05-07 | — | — | CN | disclosed |
| CN-1271121-C | Polymerization regulators, and compositions for resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2006-08-23 | — | — | CN | disclosed |
| CN-1462290-A | Polymerization regulator and composition for resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-12-17 | — | — | CN | disclosed |