⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1325641 | 0.95 | — | — | |
| SCHEMBL30725571 | 0.90 | — | — | |
| SCHEMBL28151058 | 0.73 | TDP1 (0.32) | — | |
| SCHEMBL8590593 | 0.63 | — | — | |
| SCHEMBL22187031 | 0.61 | — | — | |
| SCHEMBL27517518 | 0.60 | — | — | |
| SCHEMBL2657475 | 0.60 | — | — | |
| SCHEMBL3292589 | 0.57 | TSHR (0.33) | — | |
| SCHEMBL11668820 | 0.57 | — | — | |
| Carbon Dioxide SCHEMBL318318 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1667504-B | Silver halide emulsion and silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO LTD | 2010-11-24 | — | — | CN | disclosed |
| CN-100520574-C | Silver halide photosensitive material | FUJI PHOTO FILM CO LTD (JP) | 2009-07-29 | — | — | CN | disclosed |
| CN-100447668-C | Silver halides color photographic sensitive material and color image forming method | FUJI PHOTO FILM CO LTD (JP) | 2008-12-31 | — | — | CN | disclosed |
| CN-1667504-A | Silver halide emulsion and silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 2005-09-14 | — | — | CN | disclosed |
| CN-1517789-A | Silver halides color photographic sensitive material and color image forming method | 富士胶片株式会社 | 2004-08-04 | — | — | CN | disclosed |
| CN-1365024-A | Silver halide photosensitive material | FUJI PHOTO FILM CO LTD (JP) | 2002-08-21 | — | — | CN | disclosed |