Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.47 |
| ▸ | CYP2A6 | P11509 | 8/20 | 0.94 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.94 |
| ▸ | CYP1A2 | P05177 | 9/20 | 0.63 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.61 |
| ▸ | HPGD | P15428 | 4/20 | 0.61 |
| ▸ | TSHR | P16473 | 6/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.46 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | CASP7 | P55210 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL14954176 | 0.97 | CYP2A6 (0.90) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| Iodide SCHEMBL14954226 | 0.97 | CYP2A6 (0.90) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| Iodide SCHEMBL27615583 | 0.97 | CYP2A6 (0.90) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| SCHEMBL3075 | 0.97 | CYP2A6 (1.00) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| SCHEMBL7517852 | 0.97 | CYP2A6 (1.00) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| SCHEMBL10684163 | 0.97 | CYP2A6 (1.00) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| SCHEMBL29903166 | 0.97 | CYP2A6 (1.00) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| Hydrochloric Acid SCHEMBL6705962 | 0.94 | CYP2A6 (0.94) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| Naphthalene SCHEMBL3447588 | 0.94 | CYP2A6 (0.94) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD | |
| O-Xylene SCHEMBL7050723 | 0.94 | CYP2A6 (0.94) | CYP2A6ALDH1A1CYP1A2HSD17B10HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104035278-A | Photosensitive Resin Composition And Spacer Preprared From The Same | DONGWOO FINE CHEM CO LTD | 2014-09-10 | — | — | CN | disclosed |
| CN-101770168-B | Photosensitive resin composition | SUMITOMO CHEMICAL CO | 2013-06-26 | — | — | CN | disclosed |
| CN-1841197-B | X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element | JSR CORP | 2011-07-06 | — | — | CN | disclosed |
| CN-1800981-B | Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD | 2010-12-01 | — | — | CN | disclosed |
| CN-1760757-B | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO | 2010-11-10 | — | — | CN | disclosed |
| CN-1760758-B | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO | 2010-11-03 | — | — | CN | disclosed |
| CN-101792568-A | Cured film | SUMITOMO CHEMICAL CO | 2010-08-04 | — | — | CN | disclosed |
| CN-101770168-A | Photosensitive resin composition | SUMITOMO CHEMICAL CO | 2010-07-07 | — | — | CN | disclosed |
| CN-101735400-A | Curable resin composition | SUMITOMO CHEMICAL CO | 2010-06-16 | — | — | CN | disclosed |
| CN-101387829-A | Radiation-sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2009-03-18 | — | — | CN | disclosed |
| CN-101359175-A | Photoresist compistion | SUMITOMO CHEMICAL CO (JP) | 2009-02-04 | — | — | CN | disclosed |
| CN-101206402-A | Photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2008-06-25 | — | — | CN | disclosed |
| CN-1841197-A | X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element | JSR CORP (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1841195-A | X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof, and liquid crystal display element | JSR CORP (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1800981-A | Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-07-12 | — | — | CN | disclosed |
| CN-1760758-A | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1760757-A | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1760756-A | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |