SCHEMBL27636732

SCHEMBL27636732

CCCCCCCCCCCCCCCC(CCCC)(CCCC)CCCC

nearest known ligand 0.53

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.53
THRB P10828 1/20 0.53
GGPS1 O95749 6/20 0.44
FDPS P14324 9/20 0.42
SMPD1 P17405 2/20 0.41
CES2 O00748 1/20 0.41
LPAR1 Q92633 1/20 0.41
LPAR3 Q9UBY5 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27583529 1.00 TSHR (0.53) TSHRTHRBGGPS1FDPSSMPD1
SCHEMBL28240166 1.00 TSHR (0.53) TSHRTHRBGGPS1FDPSSMPD1
SCHEMBL28308418 1.00 TSHR (0.53) TSHRTHRBGGPS1FDPSSMPD1
SCHEMBL27977497 1.00 TSHR (0.53) TSHRTHRBGGPS1FDPSSMPD1
SCHEMBL27825126 1.00 TSHR (0.53) TSHRTHRBGGPS1FDPSSMPD1
SCHEMBL27977749 1.00 TSHR (0.53) TSHRTHRBGGPS1FDPSSMPD1
Ammonia Solution, Strong SCHEMBL27287326 0.97 TSHR (0.50) TSHRTHRBGGPS1FDPSSMPD1
Ammonia Solution, Strong SCHEMBL28154270 0.97 TSHR (0.50) TSHRTHRBGGPS1FDPSSMPD1
Propane SCHEMBL11498975 0.97 TSHR (0.50) TSHRTHRBGGPS1FDPSSMPD1
Phosphine SCHEMBL28181005 0.97 TSHR (0.50) TSHRTHRBGGPS1FDPSSMPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108570146-A For melt polymerization makrolon ionic catalyst and utilize its method 沙特基础工业全球技术有限公司 2018-09-25 CN claimed
CN-101538376-A Antistatic agent for resin, antistatic resin composition, and antistatic resin molded article NIPPON CHEMICAL IND (JP) 2009-09-23 CN disclosed
CN-1729242-A Antistatic agent for resin, antistatic resin composition, and antistatic resin molded article NIPPON CHEMICAL IND (JP) 2006-02-01 CN disclosed