⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL814606 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL3894154 | 0.72 | — | — | |
| SCHEMBL6693498 | 0.64 | — | — | |
| SCHEMBL2900251 | 0.62 | — | — | |
| SCHEMBL11588450 | 0.61 | — | — | |
| Iodide SCHEMBL7059860 | 0.61 | — | — | |
| SCHEMBL8973091 | 0.61 | — | — | |
| Hydrochloric Acid SCHEMBL7061167 | 0.61 | — | — | |
| Bromide SCHEMBL7061830 | 0.60 | — | — | |
| Iodide SCHEMBL7059334 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101568607-B | Radiation-resistant polypropylene material | FINA TECHNOLOGY | 2012-04-25 | — | — | CN | disclosed |
| CN-101568607-A | Radiation-resistant polypropylene material | FINA TECHNOLOGY (US) | 2009-10-28 | — | — | CN | disclosed |
| CN-1708516-A | Synthesis of polymerization catalyst components | UNIVATION TECH LLC (US) | 2005-12-14 | — | — | CN | disclosed |