Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15274253 | 1.00 | MEN1 (0.33) | MEN1KMT2ATDP1 | |
| SCHEMBL15274252 | 1.00 | MEN1 (0.33) | MEN1KMT2ATDP1 | |
| SCHEMBL16768586 | 0.92 | MEN1 (0.33) | MEN1KMT2ATDP1 | |
| SCHEMBL13913354 | 0.69 | MEN1 (0.32) | MEN1KMT2ATDP1 | |
| SCHEMBL16478900 | 0.67 | — | — | |
| SCHEMBL13913356 | 0.66 | — | — | |
| SCHEMBL693244 | 0.65 | — | — | |
| Perfluorocyclobutane SCHEMBL24521 | 0.65 | MEN1 (0.62) | MEN1KMT2ATDP1 | |
| SCHEMBL554655 | 0.65 | MEN1 (0.62) | MEN1KMT2ATDP1 | |
| SCHEMBL7260823 | 0.65 | MEN1 (0.62) | MEN1KMT2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101556948-B | Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd | TOKYO ELECTRON LTD | 2012-09-19 | — | — | CN | disclosed |
| CN-1868044-B | Semiconductor device, method for manufacturing semiconductor device, and gas for plasma CVD | TOKYO ELECTRON LTD | 2012-04-18 | — | — | CN | disclosed |
| CN-101556948-A | Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd | TOKYO ELECTRON LTD (JP) | 2009-10-14 | — | — | CN | disclosed |
| CN-1930415-A | Apparatus for producing gas, vessel for supplying gas and gas for use in manufacturing electronic device | OHMI TADAHIRO (JP) | 2007-03-14 | — | — | CN | disclosed |
| CN-1868044-A | Semiconductor device, method for manufacturing semiconductor device, and gas for plasma CVD | TOKYO ELECTRON LTD (JP) | 2006-11-22 | — | — | CN | disclosed |