SCHEMBL276525

SCHEMBL276525

C=C([CH]C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16288324 0.73
SCHEMBL24465008 0.73
SCHEMBL181797 0.73
SCHEMBL181798 0.73
SCHEMBL93809 0.71
SCHEMBL13813984 0.71
SCHEMBL24791374 0.71
SCHEMBL16287972 0.69
SCHEMBL182649 0.69
SCHEMBL11990713 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 679 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
EP-4398285-A1 ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
CN-118295212-A Composition for forming resist underlayer film containing glycol structure 日产化学株式会社 2024-07-05 CN disclosed
US-20240218293-A1 CLEANING AGENT COMPOSITION AND CLEANING METHOD NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-12025916-B2 Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added NISSAN CHEMICAL CORPORATION (JP) 2024-07-02 US disclosed
US-20240201592-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
WO-2024128199-A1 RELEASER COMPOSITION FOR PHOTOIRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR PHOTOIRRADIATION RELEASE 日産化学株式会社 2024-06-20 WO disclosed
WO-2024122488-A1 COMPOSITION FOR FORMING PROTECTIVE FILM 日産化学株式会社 2024-06-13 WO disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
US-6852862-B2 Process for producing quinoline-3-carboxylic acid compound SUMIKA FINE CHEMICALS CO., LTD. (JP) 2005-02-08 US disclosed
WO-2004108683-A1 3-ALKYLIDENEHYDRAZINO SUBSTITUTED HETEROARYL COMPOUNDS AS THROMBOPOIETIN RECEPTOR ACTIVATORS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-12-16 WO disclosed
CN-1494531-A Process for producing quinoline-3-carboxylic acid compound ס����ϸ��ѧ���޹�˾ 2004-05-05 CN disclosed
US-20040073034-A1 Process for producing quinoline-3-carboxylic acid compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-15 US disclosed
EP-1375487-A1 PROCESS FOR PRODUCING QUINOLINE-3-CARBOXYLIC ACID COMPOUND SUMIKA FINE CHEMICALS Co., Ltd. (JP) 2004-01-02 EP disclosed
EP-0877730-B1 ARYL ACRYLICS FOR USE AS FUNGICIDE MONSANTO TECHNOLOGY LLC (US) 2002-10-02 EP disclosed
EP-0877730-A1 ARYL ACRYLICS FOR USE AS FUNGICIDE MONSANTO COMPANY (US) 1998-11-18 EP disclosed
US-5739140-A AGRICULTURAL FUNGICIDES MONSANTO COMPANY (US) 1998-04-14 US disclosed
WO-1997016413-A9 ARYL ACRYLICS FOR USE AS FUNGICIDE 1997-08-14 WO disclosed
WO-1997016413-A1 ARYL ACRYLICS FOR USE AS FUNGICIDE MONSANTO COMPANY (US) 1997-05-09 WO disclosed