SCHEMBL27656972

SCHEMBL27656972

CCON(CCN)CCO

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.32
ALDH1A1 P00352 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14336083 0.90 MAPT (0.38) MAPTALDH1A1
SCHEMBL27635973 0.87
SCHEMBL17866343 0.83 MAPT (0.33) MAPTALDH1A1TSHR
SCHEMBL11798963 0.80
SCHEMBL11048429 0.73
SCHEMBL27404075 0.73 TDP1 (0.37) ALDH1A1TSHR
SCHEMBL27754210 0.71 TDP1 (0.36) ALDH1A1TSHR
SCHEMBL27774947 0.71 TDP1 (0.36) ALDH1A1TSHR
SCHEMBL27695022 0.71 TDP1 (0.36) ALDH1A1TSHR
SCHEMBL27418634 0.70 MAPT (0.35) MAPTALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108495700-A Supporting layer for forward osmosis membrane OASYS水有限公司 2018-09-04 CN disclosed
CN-100442449-C Removal of post-etch residues in semiconductor processing EKC TECHNOLOGY INC (US) 2008-12-10 CN disclosed
CN-1802731-A Removal of post-etch residues in semiconductor processing EKC TECHNOLOGY INC (US) 2006-07-12 CN disclosed