SCHEMBL27675441

SCHEMBL27675441

CC=C(C)C(=O)O.O=c1[nH]c(=O)n(CCO)c(=O)[nH]1

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 1/20 0.35
PKM P14618 1/20 0.32
HPGD P15428 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
UNG P13051 2/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26123941 0.87 APEX1 (0.50) APEX1PKMHPGDSMN1; SMN2UNG
Acetic Acid SCHEMBL29067578 0.86 APEX1 (0.41) APEX1PKMHPGDSMN1; SMN2UNG
Methacrylic Acid SCHEMBL3635510 0.83 APEX1 (0.37) APEX1PKMHPGDSMN1; SMN2GAA
Methacrylic Acid SCHEMBL4450991 0.83 APEX1 (0.37) APEX1PKMHPGDSMN1; SMN2GAA
Methacrylic Acid SCHEMBL1914676 0.83 APEX1 (0.37) APEX1PKMHPGDSMN1; SMN2GAA
SCHEMBL38658685 0.82 APEX1 (0.36) APEX1PKMHPGDSMN1; SMN2
Acrylic Acid SCHEMBL3843414 0.78 APEX1 (0.38) APEX1PKMHPGDSMN1; SMN2GAA
Acrylic Acid SCHEMBL7174523 0.78 APEX1 (0.38) APEX1PKMHPGDSMN1; SMN2GAA
SCHEMBL8022374 0.77 APEX1 (0.36) APEX1PKMHPGDSMN1; SMN2UNG
SCHEMBL28331322 0.76 APEX1 (0.37) APEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1908816-B Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP 2012-09-05 CN claimed
CN-1908816-B Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP 2012-09-05 CN disclosed
CN-1908816-A Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP (JP) 2007-02-07 CN disclosed