⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL276839 | 0.80 | GGPS1 (0.34) | — | |
| SCHEMBL276729 | 0.75 | — | — | |
| SCHEMBL9751296 | 0.75 | — | — | |
| SCHEMBL3659586 | 0.73 | TSHR (0.38) | — | |
| SCHEMBL35107 | 0.71 | — | — | |
| SCHEMBL276567 | 0.71 | — | — | |
| SCHEMBL5302645 | 0.71 | CYP4F2 (0.32) | — | |
| SCHEMBL184957 | 0.71 | — | — | |
| SCHEMBL10448294 | 0.71 | — | — | |
| SCHEMBL7770930 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9543147-B2 | Photoresist and method of manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-01-10 | — | — | US | disclosed |
| EP-2439204-B1 | HETEROCYCLIC COMPOUND AND HEMATOPOIETIC STEM CELL AMPLIFIER | NISSAN CHEMICAL IND LTD (JP) | 2017-01-04 | — | — | EP | disclosed |
| US-9527828-B2 | Method for expanding hematopoietic stem cells using heterocyclic compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9502231-B2 | Photoresist layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-11-22 | — | — | US | disclosed |
| EP-2218716-B1 | METHOD FOR AMPLIFYING HEMATOPOIETIC STEM CELLS USING HETEROCYCLIC COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2016-11-16 | — | — | EP | disclosed |
| US-9460909-B2 | Method for manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-10-04 | — | — | US | disclosed |
| US-9436086-B2 | Anti-reflective layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-09-06 | — | — | US | disclosed |
| US-20160155626-A1 | Method for Manufacturing Semiconductor Device | TAIWAN SEMICONDUCTOR MFG (TW) | 2016-06-02 | — | — | US | disclosed |
| US-20160155632-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MFG (TW) | 2016-06-02 | — | — | US | disclosed |
| US-9328085-B2 | Heterocyclic compounds and expansion agents for hematopoietic stem cells | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-05-03 | — | — | US | disclosed |
| EP-0668852-B1 | SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES | BASF AG (DE) | 1998-02-25 | — | — | EP | disclosed |
| US-5707936-A | PESTICIDES, FUNGICIDES | BASF AKTIENGESELLSCHAFT (DE) | 1998-01-13 | — | — | US | disclosed |
| US-5633268-A | FUNGICIDES, INSECTICIDES, PESTICIDES | BASF AKTIENGESELLSCHAFT (DE) | 1997-05-27 | — | — | US | disclosed |
| EP-0686152-B1 | ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES | BASF AG (DE) | 1997-05-02 | — | — | EP | disclosed |
| EP-0757042-A1 | Ortho-substituted 2-methoxyiminophenylaceticacid methylester | BASF Aktiengesellschaft (DE) | 1997-02-05 | — | — | EP | disclosed |
| WO-1994019331-A1 | ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES | BASF AKTIENGESELLSCHAFT (DE) | 1994-09-01 | — | — | WO | disclosed |
| EP-0414058-B1 | Carboxylic acid derivatives | BASF AG (DE) | 1994-06-15 | — | — | EP | disclosed |
| WO-1994011334-A1 | SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES | BASF AKTIENGESELLSCHAFT (DE) | 1994-05-26 | — | — | WO | disclosed |
| US-5085685-A | Herbicides | BASF AKTIENGESELLSCHAFT (DE) | 1992-02-04 | — | — | US | disclosed |
| EP-0414058-A2 | Carboxylic acid derivatives | BASF Aktiengesellschaft (DE) | 1991-02-27 | — | — | EP | disclosed |