SCHEMBL2769018

SCHEMBL2769018

C=CC(=O)OC(O)C(C)(C)C.C=CC(=O)OCCO

nearest known ligand 0.63

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.63
HPGD P15428 1/20 0.44
ALDH1A1 P00352 4/20 0.44
TP53 P04637 3/20 0.44
HIF1A Q16665 3/20 0.44
CYP3A4 P08684 2/20 0.44
HSD17B10 Q99714 1/20 0.44
THRB P10828 2/20 0.41
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL398079 0.86 TSHR (0.39) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27604719 0.83 TSHR (0.68) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL11541843 0.80 TSHR (0.63) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL8966120 0.80 TSHR (0.48) TSHRHPGDALDH1A1TP53HIF1A
Methyl Alcohol SCHEMBL28276837 0.80 TSHR (0.91) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL14875 0.80
SCHEMBL21630258 0.80 TSHR (1.00) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL30363554 0.80 TSHR (1.00) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL798338 0.79 TSHR (0.68) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9138445 0.79 TSHR (0.73) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1117002-B1 Negative-working resist composition FUJIFILM CORP (JP) 2010-04-14 EP disclosed
US-20080318159-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-7214467-B2 Photosensitive resin composition FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed
EP-1480079-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2004-11-24 EP disclosed
US-20040009430-A1 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
EP-1376232-A1 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2004-01-02 EP disclosed