SCHEMBL27730293

SCHEMBL27730293

C1=CCC=C1.C=C(C)C(=C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL292020 0.90
SCHEMBL10901875 0.90
Methacrylic Acid SCHEMBL2132148 0.83 TDP1 (0.35)
Methacrylic Acid SCHEMBL5971159 0.83 TDP1 (0.35)
Methacrylic Acid SCHEMBL11133544 0.83 TDP1 (0.35)
Methacrylic Acid SCHEMBL542903 0.83 TDP1 (0.35)
Methacrylic Acid SCHEMBL22158033 0.81 TDP1 (0.33)
Methacrylic Acid SCHEMBL27756528 0.81 TDP1 (0.33)
SCHEMBL16099085 0.81 TDP1 (0.60)
SCHEMBL28236491 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101365821-B Method for depositing metallic film JSR CORP 2011-10-05 CN disclosed
CN-101365821-A Method for depositing metallic film JSR CORP (JP) 2009-02-11 CN disclosed