SCHEMBL27765110

SCHEMBL27765110

NCC#CC1C=CC=CC1=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27813982 0.71
SCHEMBL27657601 0.71
SCHEMBL3677732 0.66
SCHEMBL28172384 0.62
SCHEMBL27498729 0.62
SCHEMBL29007204 0.62
SCHEMBL27505476 0.62
SCHEMBL10509311 0.60
Water SCHEMBL27397330 0.60
SCHEMBL10580765 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102144281-B In-situ chamber treatment and deposition process APPLIED MATERIALS INC 2014-06-25 CN disclosed
CN-102007573-B Selective cobalt deposition on copper surfaces APPLIED MATERIALS INC 2013-02-13 CN disclosed
CN-101466863-B Process for forming cobalt-containing materials APPLIED MATERIALS INC 2011-08-10 CN disclosed
CN-102144281-A In-situ chamber treatment and deposition process APPLIED MATERIALS INC 2011-08-03 CN disclosed
CN-102132383-A Cobalt deposition on barrier surfaces APPLIED MATERIALS INC 2011-07-20 CN disclosed
CN-102007573-A Selective cobalt deposition on copper surfaces APPLIED MATERIALS INC 2011-04-06 CN disclosed
CN-101466863-A Process for forming cobalt-containing materials APPLIED MATERIALS INC (US) 2009-06-24 CN disclosed