SCHEMBL2776715

SCHEMBL2776715

Nc1ccc(C=Cc2ccccc2N)cc1

nearest known ligand 0.64

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 12/20 0.64
MAOA P21397 2/20 0.64
MAOB P27338 2/20 0.64
APP P05067 2/20 0.50
NFE2L2 Q16236 4/20 0.44
MEN1 O00255 1/20 0.43
NPC1 O15118 1/20 0.43
MAPT P10636 1/20 0.43
CASP3 P42574 1/20 0.43
RAB9A P51151 1/20 0.43
KMT2A Q03164 1/20 0.43
ATM Q13315 1/20 0.43
SENP7 Q9BQF6 1/20 0.43
SENP6 Q9GZR1 1/20 0.43
TRPA1 O75762 1/20 0.42
NQO2 P16083 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2776707 1.00 CYP19A1 (0.64) CYP19A1MAOAMAOBAPPNFE2L2
SCHEMBL11301695 0.93 CYP19A1 (0.52) CYP19A1MAOAMAOBAPPNFE2L2
SCHEMBL11296111 0.89 CYP19A1 (0.73) CYP19A1MAOAMAOBAPPNFE2L2
(Z)-1,2-Diphenylethene SCHEMBL28164872 0.86 MAOB (0.56) CYP19A1MAOAMAOBNFE2L2MEN1
SCHEMBL3885086 0.86 MAOB (0.56) CYP19A1MAOAMAOBNFE2L2MEN1
SCHEMBL5431188 0.86 MAOB (0.56) CYP19A1MAOAMAOBNFE2L2MEN1
SCHEMBL911942 0.86 MAOB (0.56) CYP19A1MAOAMAOBNFE2L2MEN1
SCHEMBL29397541 0.86 MAOB (0.56) CYP19A1MAOAMAOBNFE2L2MEN1
SCHEMBL10701354 0.84 MAOB (0.54) CYP19A1MAOAMAOBNFE2L2MEN1
SCHEMBL65321 0.83 CYP3A4 (0.53) CYP19A1MAOAMAOBNFE2L2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP claimed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US claimed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP claimed
US-20100302927-A1 OPTICAL DATA STORAGE MEDIUM AND METHODS FOR USING THE SAME GENERAL ELECTRIC COMPANY (US) 2010-12-02 US disclosed
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP disclosed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US disclosed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP disclosed