⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9341820 | 0.82 | SLC22A6 (0.46) | — | |
| SCHEMBL1138452 | 0.78 | — | — | |
| SCHEMBL28409246 | 0.77 | SLC22A6 (0.42) | — | |
| SCHEMBL9387470 | 0.76 | SLC22A6 (0.37) | — | |
| SCHEMBL18577715 | 0.76 | SLC22A6 (0.37) | — | |
| SCHEMBL10624529 | 0.76 | SLC22A6 (0.37) | — | |
| SCHEMBL743651 | 0.74 | — | — | |
| SCHEMBL8405013 | 0.74 | — | — | |
| SCHEMBL12854177 | 0.74 | — | — | |
| Potassium Ion SCHEMBL28669135 | 0.74 | TP53 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114044894-B | Tertiary amine group-containing aryl ether-based polymer, preparation method thereof and quaternary ammonium salt modified polyarylether-based ultrafiltration membrane | 吉林大学 | 2022-08-12 | — | — | CN | claimed |
| CN-113769592-B | Quaternized modified polyarylether membrane material and preparation method and application thereof | 吉林大学 | 2022-06-24 | — | — | CN | claimed |
| CN-114044894-A | Tertiary amine group-containing aryl ether-based polymer, preparation method thereof and quaternary ammonium salt modified polyarylether-based ultrafiltration membrane | 吉林大学 | 2022-02-15 | — | — | CN | claimed |
| CN-113769592-A | Quaternized modified polyarylether membrane material and preparation method and application thereof | 吉林大学 | 2021-12-10 | — | — | CN | claimed |
| CN-114044894-B | Tertiary amine group-containing aryl ether-based polymer, preparation method thereof and quaternary ammonium salt modified polyarylether-based ultrafiltration membrane | 吉林大学 | 2022-08-12 | — | — | CN | disclosed |
| CN-113769592-B | Quaternized modified polyarylether membrane material and preparation method and application thereof | 吉林大学 | 2022-06-24 | — | — | CN | disclosed |
| CN-114044894-A | Tertiary amine group-containing aryl ether-based polymer, preparation method thereof and quaternary ammonium salt modified polyarylether-based ultrafiltration membrane | 吉林大学 | 2022-02-15 | — | — | CN | disclosed |
| CN-113769592-A | Quaternized modified polyarylether membrane material and preparation method and application thereof | 吉林大学 | 2021-12-10 | — | — | CN | disclosed |
| CN-109563371-A | Polysiloxane composition comprising having carried out the silanol group of acetal protection | 日产化学株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-107615168-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2018-01-19 | — | — | CN | disclosed |
| CN-106610566-A | Chemically amplified positive resist composition and patterning process | 信越化学工业株式会社 | 2017-05-03 | — | — | CN | disclosed |
| CN-101625524-B | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO JP | 2012-11-28 | — | — | CN | disclosed |
| CN-101625523-B | Resist patterning forming process and manufacturing method of photo mask | SHIN ETSU EHEMICAL CO LTD | 2012-09-19 | — | — | CN | disclosed |
| CN-102591152-A | Resist composition and patterning process | SHIN ETSU EHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102520581-A | Method for forming photoresist pattern | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| CN-101625523-A | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |