SCHEMBL2780876

SCHEMBL2780876

CC(C)O[Si](OC(C)C)(OC(C)C)C(C)C1CCC2OC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3747862 0.85
SCHEMBL128990 0.85 PPM1B (0.31)
SCHEMBL15264289 0.83
SCHEMBL28827588 0.80
SCHEMBL187690 0.80
SCHEMBL23441660 0.79
SCHEMBL4200508 0.79
SCHEMBL797868 0.78
SCHEMBL188425 0.78 PPM1B (0.33)
SCHEMBL2300316 0.77 PPM1B (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11094899-B2 Method for manufacturing field effect transistor and method for manufacturing wireless communication device TORAY INDUSTRIES, INC. 2021-08-17 US disclosed
US-20190198786-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2019-06-27 US disclosed
EP-2259289-A1 GATE INSULATING MATERIAL, GATE INSULATING FILM, AND ORGANIC FIELD EFFECT TRANSISTOR Toray Industries, Inc. (JP) 2010-12-08 EP disclosed