Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18575346 | 1.00 | — | — | |
| SCHEMBL16341307 | 1.00 | — | — | |
| SCHEMBL7109941 | 0.87 | — | — | |
| SCHEMBL5703964 | 0.87 | — | — | |
| SCHEMBL19436367 | 0.87 | — | — | |
| SCHEMBL7544515 | 0.82 | — | — | |
| SCHEMBL5016237 | 0.82 | — | — | |
| SCHEMBL1759642 | 0.82 | — | — | |
| SCHEMBL29159 | 0.82 | — | — | |
| SCHEMBL36860 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116732497-B | Method for depositing ruthenium-containing films on substrates by cyclical deposition processes | ASM IP私人控股有限公司 | 2025-06-17 | — | — | CN | claimed |
| US-12310039-B2 | Semiconductor device including epitaxial electrode layer and dielectric epitaxial structure and method of manufacturing the same | SK Hynix Inc. (JP) | 2025-05-20 | — | — | US | claimed |
| CN-119768941-A | Metal-solid oxide composite, method for preparing the same, and solid oxide battery including the same | 三星电机株式会社 | 2025-04-04 | — | — | CN | claimed |
| CN-119698703-A | Porous solid oxide composite and solid oxide cell including the same | 三星电机株式会社 | 2025-03-25 | — | — | CN | claimed |
| CN-119698702-A | Solid oxide cell and method for manufacturing same | 三星电机株式会社 | 2025-03-25 | — | — | CN | claimed |
| CN-119605004-A | Solid oxide cell and method for manufacturing same | 三星电机株式会社 | 2025-03-11 | — | — | CN | claimed |
| WO-2024190570-A1 | AIR SECONDARY BATTERY | FDK株式会社 | 2024-09-19 | — | — | WO | claimed |
| US-11685991-B2 | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process | ASM IP HOLDING B.V. (NL) | 2023-06-27 | — | — | US | claimed |
| CN-111937198-B | Catalyst for air secondary battery and method for producing same, air secondary battery and method for producing same | FDK株式会社 | 2023-06-06 | — | — | CN | claimed |
| CN-111699278-B | Method for depositing ruthenium-containing films on substrates by cyclical deposition processes | ASM IP私人控股有限公司 | 2023-05-16 | — | — | CN | claimed |
| CN-115939111-A | Semiconductor device and method for manufacturing the same | 爱思开海力士有限公司 | 2023-04-07 | — | — | CN | claimed |
| US-20230103835-A1 | SEMICONDUCTOR DEVICE INCLUDING EPITAXIAL ELECTRODE LAYER AND DIELECTRIC EPITAXIAL STRUCTURE AND METHOD OF MANUFACTURING THE SAME | SK Hynix Inc. (KR) | 2023-04-06 | — | — | US | claimed |
| EP-3564989-B1 | ELECTROTHERMAL HYBRID MICROSYSTEM FOR CONTROLLED DISPENSING OF FRAGRANCES AND AROMAS | INST DE PESQUISAS TECNOLOGICAS DO ESTADO DE SAO PAULO S A IPT (BR) | 2023-02-01 | — | — | EP | claimed |
| EP-4106053-A1 | ZINC NEGATIVE ELECTRODE AND MANUFACTURING METHOD THEREFOR, AND SECONDARY CELL COMPRISING SAID ZINC NEGATIVE ELECTRODE AND MANUFACTURING METHOD THEREFOR | The Doshisha (JP) | 2022-12-21 | — | — | EP | claimed |
| US-11495804-B2 | Air electrode catalyst for air secondary battery and air secondary battery | FDK CORPORATION (JP) | 2022-11-08 | — | — | US | claimed |
| US-20210095372-A1 | A METHOD FOR DEPOSITING A RUTHENIUM-CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS | UNIVERSITEIT GENT (BE) | 2021-04-01 | — | — | US | claimed |
| EP-3737779-A1 | A METHOD FOR DEPOSITING A RUTHENIUM-CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS | ASM IP Holding B.V. (NL) | 2020-11-18 | — | — | EP | claimed |
| CN-111937198-A | Method for producing catalyst for air secondary battery, method for producing air secondary battery, catalyst for air secondary battery, and air secondary battery | FDK株式会社 | 2020-11-13 | — | — | CN | claimed |
| CN-111699278-A | Method for depositing ruthenium-containing films on substrates by cyclic deposition process | ASM IP私人控股有限公司 | 2020-09-22 | — | — | CN | claimed |
| US-20200251746-A1 | AIR ELECTRODE CATALYST FOR AIR SECONDARY BATTERY AND AIR SECONDARY BATTERY | JAPAN METALS AND CHEMICALS CO., LTD. (JP) | 2020-08-06 | — | — | US | claimed |