SCHEMBL278236

SCHEMBL278236

C=CCN(CC=C)C(C)OC(=O)C=C

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.42
KMT2A Q03164 3/20 0.35
MEN1 O00255 2/20 0.35
HPGD P15428 1/20 0.33
ALDH1A1 P00352 5/20 0.32
TP53 P04637 2/20 0.32
HIF1A Q16665 2/20 0.32
CYP3A4 P08684 1/20 0.32
HSD17B10 Q99714 1/20 0.32
THRB P10828 1/20 0.32
HCAR2 Q8TDS4 1/20 0.31
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL618084 0.82 TSHR (0.39) TSHRKMT2AMEN1ALDH1A1KDM4E
SCHEMBL14923 0.82 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL3203184 0.82 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL5993556 0.81 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
Ammonia Solution, Strong SCHEMBL28293803 0.81 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A
Chloromethane SCHEMBL1127605 0.79 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
Hydrochloric Acid SCHEMBL28153943 0.79 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL829905 0.79 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL555857 0.79 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL2053978 0.78 TSHR (0.36) TSHRKMT2AMEN1HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 647 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3730524-B1 METHOD FOR PRODUCING ANIONIC WATER-SOLUBLE POLYMER ON THE BASIS OF BIOACRYLAMIDE AND ACRYLIC ACID SNF GROUP (FR) 2024-02-07 EP claimed
US-11702513-B2 Aqueous dispersion of hydrosoluble or hydroswellable polymer S.P.C.M. SA (FR) 2023-07-18 US claimed
EP-3795664-B1 WATER-SOLUBLE OR WATER-SWELLABLE POLYMER AQUEOUS DISPERSION SPCM SA (FR) 2023-01-25 EP claimed
CN-111278876-B Method for producing anionic water-soluble polymers based on bioacrylamide and acrylic acid 爱森(中国)絮凝剂有限公司 2022-02-25 CN claimed
EP-3386288-B1 SEED TREATMENT USING HYDROSWELLABLE POLYMER SPCM SA (FR) 2021-11-10 EP claimed
US-20210171684-A1 METHOD FOR PRODUCING ANIONIC WATER-SOLUBLE POLYMER ON THE BASIS OF BIOACRYLAMIDE AND ACRYLIC ACID S.P.C.M. SA (FR) 2021-06-10 US claimed
US-20210079169-A1 AQUEOUS DISPERSION OF HYDROSOLUBLE OR HYDROSWELLABLE POLYMER SNF GROUP (FR) 2021-03-18 US claimed
CN-107207964-B Local irrigation method S.P.C.M.股份公司 2021-03-09 CN claimed
EP-3261430-B1 LOCALIZED IRRIGATION METHOD SPCM SA (FR) 2021-02-17 EP claimed
EP-3730524-A1 METHOD FOR PRODUCING ANIONIC WATER-SOLUBLE POLYMER ON THE BASIS OF BIOACRYLAMIDE AND ACRYLIC ACID S.P.C.M. SA (FR) 2020-10-28 EP claimed
EP-0225186-B1 PROCESS FOR GRAFTING MALEIC ANHYDRIDE OR STYRENE-MALEIC ANHYDRIDE ONTO POLYOLEFINS THE STANDARD OIL COMPANY (US) 1991-10-16 EP claimed
US-4973614-A ETHYLENICALLY UNSATURATED MONOMER AND WATER INSOLUBLE EPOXY RESIN DAINIPPON INK AND CHEMICALS, INC. (JP) 1990-11-27 US claimed
EP-0215978-B1 LIQUID ELECTROPHORETIC DEVELOPER COMPOSITION AGFA-GEVAERT N.V. (BE) 1990-03-21 EP claimed
EP-0356592-A1 Process for producing emulsion polymer composition DAINIPPON INK AND CHEMICALS, INC. (JP) 1990-03-07 EP claimed
US-4753997-A FREE RADICAL PEROXIDE INITIATOR, TERIARY AMINE CATALYST WITH OXYGEN, NITROGEN OR SULFUR MOIETIES THE STANDARD OIL COMPANY (US) 1988-06-28 US claimed
EP-0225186-A2 Process for grafting maleic anhydride or styrene-maleic anhydride onto polyolefins THE STANDARD OIL COMPANY (US) 1987-06-10 EP claimed
EP-0215978-A1 Liquid electrophoretic developer composition AGFA-GEVAERT N.V. (BE) 1987-04-01 EP claimed
US-4520008-A ADDITION POLYMER AND PROPYLENE OXIDE-ETHYLENE OXIDE ADDUCT OF A FATTY ALCOHOL; TEXTURE KAO SOAP CO., LTD. (JP) 1985-05-28 US claimed
US-4454219-A Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer HITACHI CHEMICAL COMPANY, LTD. (JP) 1984-06-12 US claimed
US-4070348-A CROSSLINKING ROHM GMBH (DT) 1978-01-24 US claimed