Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.57 |
| ▸ | LPAR3 | Q9UBY5 | 8/20 | 0.53 |
| ▸ | LPAR2 | Q9HBW0 | 6/20 | 0.53 |
| ▸ | LPAR1 | Q92633 | 3/20 | 0.53 |
| ▸ | P2RY10 | O00398 | 4/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.39 |
| ▸ | GPR34 | Q9UPC5 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27785449 | 1.00 | TSHR (0.57) | TSHRLPAR3LPAR2LPAR1P2RY10 | |
| SCHEMBL27813919 | 1.00 | TSHR (0.57) | TSHRLPAR3LPAR2LPAR1P2RY10 | |
| SCHEMBL14992893 | 1.00 | TSHR (0.57) | TSHRLPAR3LPAR2LPAR1P2RY10 | |
| SCHEMBL28325465 | 0.98 | TSHR (0.54) | TSHRLPAR3LPAR2LPAR1P2RY10 | |
| SCHEMBL27881679 | 0.93 | TSHR (0.47) | TSHRLPAR3LPAR2LPAR1 | |
| SCHEMBL2638491 | 0.86 | TSHR (0.42) | TSHRLPAR3LPAR2LPAR1 | |
| SCHEMBL3448813 | 0.86 | TSHR (0.75) | TSHRLPAR3LPAR2LPAR1P2RY10 | |
| SCHEMBL29176806 | 0.85 | TSHR (0.39) | TSHRLPAR3LPAR2LPAR1 | |
| SCHEMBL29259528 | 0.85 | TSHR (0.59) | TSHRLPAR3LPAR2LPAR1CES2 | |
| SCHEMBL3447617 | 0.84 | TSHR (0.68) | TSHRLPAR3LPAR2LPAR1P2RY10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110402478-A | Surface treatment composition and method for producing same, and surface treatment method and method for producing semiconductor substrate using surface treatment composition | FUJIMI INC | 2019-11-01 | — | — | CN | disclosed |
| CN-110383426-A | The manufacturing method of the surface treatment method and semiconductor substrate of surface treating composition and its manufacturing method and use surface treating composition | 福吉米株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-102108281-B | Polishing composition | KAO CORP | 2015-07-01 | — | — | CN | disclosed |
| CN-103503068-A | Manufacturing method of magnetic disk substrate | KAO CORP | 2014-01-08 | — | — | CN | disclosed |
| CN-103339673-A | Method for manufacturing magnetic disc substrate | KAO CORP | 2013-10-02 | — | — | CN | disclosed |
| CN-102108281-A | Polishing composition | KAO CORP | 2011-06-29 | — | — | CN | disclosed |