⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL63557 | 0.83 | — | — | |
| SCHEMBL15321998 | 0.83 | MEN1 (0.33) | — | |
| SCHEMBL9326718 | 0.83 | — | — | |
| SCHEMBL125130 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL1367308 | 0.77 | — | — | |
| SCHEMBL3734760 | 0.77 | — | — | |
| Methane SCHEMBL10426222 | 0.77 | — | — | |
| SCHEMBL24134604 | 0.72 | — | — | |
| SCHEMBL893167 | 0.72 | — | — | |
| SCHEMBL14047913 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114015157-A | Preparation process of high-molecular sound-insulation nonpolar material for cars | 常州市福欧车辆配件有限公司 | 2022-02-08 | — | — | CN | claimed |
| US-9416453-B2 | Electroless gold plating liquid | MK CHEM & TECH (KR) | 2016-08-16 | — | — | US | claimed |
| US-20160040296-A1 | ELECTROLESS GOLD PLATING LIQUID | MK CHEM & TECH (KR) | 2016-02-11 | — | — | US | claimed |
| CN-117887037-A | Biuret polyisocyanate composition and preparation method thereof | 万华化学（宁波）有限公司 | 2024-04-16 | — | — | CN | disclosed |
| US-20240017239-A1 | MXene Sorbent For Removal Of Small Molecules From Dialysate | UNIVERSITY OF BRIGHTON (GB) | 2024-01-18 | — | — | US | disclosed |
| US-11772066-B2 | MXene sorbent for removal of small molecules from dialysate | DREXEL UNIVERSITY (US) | 2023-10-03 | — | — | US | disclosed |
| CN-115851208-A | UV (ultraviolet) moisture dual-curing reaction type polyurethane hot melt adhesive and preparation method thereof | 烟台德邦科技股份有限公司 | 2023-03-28 | — | — | CN | disclosed |
| CN-113582869-B | Process method for producing oxamide and methyl carbamate in series | 中国科学院福建物质结构研究所 | 2022-06-10 | — | — | CN | disclosed |
| CN-113582869-B | Process method for producing oxamide and methyl carbamate in series | 中国科学院福建物质结构研究所 | 2022-06-10 | — | — | CN | disclosed |
| CN-114015157-A | Preparation process of high-molecular sound-insulation nonpolar material for cars | 常州市福欧车辆配件有限公司 | 2022-02-08 | — | — | CN | disclosed |
| CN-113582869-A | Process method for producing oxamide and methyl carbamate in series | 中国科学院福建物质结构研究所 | 2021-11-02 | — | — | CN | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7220520-B2 | Photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-05-22 | — | — | US | disclosed |
| US-20070099111-A1 | Novel positive photosensitive polybenzoxazole precursor compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-05-03 | — | — | US | disclosed |
| US-7195849-B2 | Photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2007-03-27 | — | — | US | disclosed |
| WO-2002020493-A3 | A TRACELESS SOLID-PHASE SYNTHESIS OF 2-IMIDAZOLONES | CHUGAI PHARMACEUTICAL CO LTD (JP) | 2002-10-31 | — | — | WO | disclosed |
| WO-2002020493-A2 | A TRACELESS SOLID-PHASE SYNTHESIS OF 2-IMIDAZOLONES | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2002-03-14 | — | — | WO | disclosed |
| CN-1050502-C | Feed additive | FANG GUOXIANG (CN) | 2000-03-22 | — | — | CN | disclosed |
| CN-1149982-A | Feed additive | FANG GUOXIANG (CN) | 1997-05-21 | — | — | CN | disclosed |
| CN-1010589-B | Modified acrylate resin emulsion and preparation thereof | XUE ZHICHUN (CN) | 1990-11-28 | — | — | CN | disclosed |