Nitric Acid

Nitric Acid

SCHEMBL27857293

C=CC(=O)OCCO.O=[N+]([O-])O

nearest known ligand 0.76

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ERG11

The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.76
ALDH1A1 P00352 5/20 0.52
TP53 P04637 3/20 0.52
HIF1A Q16665 3/20 0.52
CYP3A4 P08684 2/20 0.52
HSD17B10 Q99714 1/20 0.52
HPGD P15428 1/20 0.47
MAPK1 P28482 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
THRB P10828 2/20 0.40
CA5A P35218 1/20 0.32
CA5B Q9Y2D0 1/20 0.32
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14875 0.87
SCHEMBL30363554 0.87 TSHR (1.00) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL21630258 0.87 TSHR (1.00) TSHRALDH1A1TP53HIF1ACYP3A4
Ethylene SCHEMBL8850416 0.85 TSHR (0.95) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL2457464 0.85
Ethylene SCHEMBL2946941 0.85 TSHR (0.95) TSHRALDH1A1TP53HIF1ACYP3A4
Ethylene Glycol SCHEMBL8650028 0.85 TSHR (0.95) TSHRALDH1A1TP53HIF1ACYP3A4
Ethylene SCHEMBL4213298 0.85 TSHR (0.95) TSHRALDH1A1TP53HIF1ACYP3A4
Ethylene SCHEMBL259312 0.85 TSHR (0.95) TSHRALDH1A1TP53HIF1ACYP3A4
Ethylene SCHEMBL8048018 0.85 TSHR (0.95) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119638538-A Al/HMX/neutral macromolecular bonding agent compound and preparation method thereof 西安近代化学研究所 2025-03-18 CN claimed
CN-115974629-B Low-sensitivity high-strength HMX-based composite material, preparation method and application thereof 西安近代化学研究所 2024-05-28 CN claimed
CN-116041124-B Poly (hydroxyethyl acrylate) nitrate modified CL-20-based composite material, preparation method and application 西安近代化学研究所 2024-01-02 CN claimed
CN-115160487-B Neutral macromolecular bonding agent, preparation method, application and solid propellant 西安近代化学研究所 2023-06-09 CN claimed
CN-116041124-A Poly (hydroxyethyl acrylate) nitrate modified CL-20-based composite material, preparation method and application 西安近代化学研究所 2023-05-02 CN claimed
CN-115974629-A Low-sensitivity high-strength HMX-based composite material, and preparation method and application thereof 西安近代化学研究所 2023-04-18 CN claimed
CN-115160487-A Neutral macromolecular bonding agent, preparation method and application thereof, and solid propellant 西安近代化学研究所 2022-10-11 CN claimed
CN-119638538-B Al/HMX/neutral macromolecular bonding agent compound and preparation method thereof 西安近代化学研究所 2025-11-11 CN disclosed
CN-119638538-A Al/HMX/neutral macromolecular bonding agent compound and preparation method thereof 西安近代化学研究所 2025-03-18 CN disclosed
CN-119638538-A Al/HMX/neutral macromolecular bonding agent compound and preparation method thereof 西安近代化学研究所 2025-03-18 CN disclosed
CN-115974629-B Low-sensitivity high-strength HMX-based composite material, preparation method and application thereof 西安近代化学研究所 2024-05-28 CN disclosed
CN-115974629-B Low-sensitivity high-strength HMX-based composite material, preparation method and application thereof 西安近代化学研究所 2024-05-28 CN disclosed
CN-116041124-B Poly (hydroxyethyl acrylate) nitrate modified CL-20-based composite material, preparation method and application 西安近代化学研究所 2024-01-02 CN disclosed
CN-116041124-A Poly (hydroxyethyl acrylate) nitrate modified CL-20-based composite material, preparation method and application 西安近代化学研究所 2023-05-02 CN disclosed
CN-116041124-A Poly (hydroxyethyl acrylate) nitrate modified CL-20-based composite material, preparation method and application 西安近代化学研究所 2023-05-02 CN disclosed
CN-115974629-A Low-sensitivity high-strength HMX-based composite material, and preparation method and application thereof 西安近代化学研究所 2023-04-18 CN disclosed
CN-115974629-A Low-sensitivity high-strength HMX-based composite material, and preparation method and application thereof 西安近代化学研究所 2023-04-18 CN disclosed
CN-115160487-A Neutral macromolecular bonding agent, preparation method and application thereof, and solid propellant 西安近代化学研究所 2022-10-11 CN disclosed
CN-115160487-A Neutral macromolecular bonding agent, preparation method and application thereof, and solid propellant 西安近代化学研究所 2022-10-11 CN disclosed
CN-102245724-A Chemical mechanical polishing solution ANJI MICROELECTRONICS SHANGHAI 2011-11-16 CN disclosed