SCHEMBL27905945

SCHEMBL27905945

CCC(C)(C)C(N)=C(N)C(C)(C)CC

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
TDP1 Q9NUW8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11922091 0.73
SCHEMBL276535 0.73
SCHEMBL4739928 0.73
SCHEMBL1221412 0.73
SCHEMBL11768519 0.71 TSHR (0.32) TSHRTDP1
Hydrochloric Acid SCHEMBL3026916 0.71
SCHEMBL29468563 0.71
SCHEMBL19505685 0.71 TSHR (0.32) TSHRTDP1
Hydrochloric Acid SCHEMBL19210226 0.71 CYP2D6 (0.43) TSHRTDP1
Hydrochloric Acid SCHEMBL9785448 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103917487-A Film-forming material, group IV metal oxide film, and vinylidene diamide complex TOSOH CORP 2014-07-09 CN disclosed
CN-103124734-A Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film TOSOH CORP 2013-05-29 CN disclosed