SCHEMBL27967682

SCHEMBL27967682

Clc1ccc(Cc2nc(-c3c(Cl)cccc3Cl)c[nH]2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.40
▸ PRNP P04156 1/20 0.40
▸ NR1H2 P55055 2/20 0.38
▸ DAO P14920 1/20 0.36
▸ NR1H3 Q13133 1/20 0.35
▸ TYMP P19971 1/20 0.34
▸ MAPK1 P28482 1/20 0.34
▸ RAB9A P51151 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ TDP1 Q9NUW8 1/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ ATM Q13315 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ TAAR1 Q96RJ0 1/20 0.33
▸ HSP90AB1 P08238 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26112528 0.89 NR1H2 (0.46) NR1H2DAONR1H3RAB9AKMT2A
SCHEMBL2868735 0.88 MEN1 (0.35) NR1H2DAONR1H3KMT2ATAAR1
SCHEMBL28406409 0.87 JAK2 (0.38) MAPTNR1H2NR1H3KMT2ASMN1; SMN2
SCHEMBL2868739 0.85 ADORA2A (0.42) TYMPMAPK1TDP1LMNA
SCHEMBL2863841 0.84 IDO1 (0.40) MAPTPRNPNR1H2NR1H3MAPK1
SCHEMBL2872330 0.84 NR1H2 (0.47) MAPTPRNPNR1H2NR1H3MAPK1
SCHEMBL26109117 0.83 ADORA2A (0.39) KMT2ASMN1; SMN2TAAR1LMNACYP1A2
SCHEMBL27967806 0.83 TAAR1 (0.50) KMT2ASMN1; SMN2TAAR1LMNA
SCHEMBL28406018 0.82 TAAR1 (0.35) NR1H2NR1H3KMT2ATAAR1
SCHEMBL28812742 0.81 SMN1; SMN2 (0.41) MAPTMAPK1RAB9AKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102119240-B Surface treating agent for copper or copper alloy and use thereof SHIKOKU CHEM 2014-07-30 — — CN disclosed
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