Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GBA1 | P04062 | 1/20 | 0.53 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.49 |
| ▸ | CCR3 | P51677 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MGLL | Q99685 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | FAAH | O00519 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8701 | 0.88 | GBA1 (0.65) | GBA1SLC18A3CCR3MGLL | |
| Hydrochloric Acid SCHEMBL28647348 | 0.86 | GBA1 (0.63) | GBA1SLC18A3CCR3MGLL | |
| Formamide SCHEMBL28177384 | 0.85 | GBA1 (0.53) | GBA1SLC18A3CCR3MEN1KMT2A | |
| Formic Acid SCHEMBL29099960 | 0.84 | GBA1 (0.49) | GBA1CCR3LMNAGAAMGLL | |
| Acrylic Acid SCHEMBL28175274 | 0.84 | GBA1 (0.49) | GBA1SLC18A3CCR3LMNAGAA | |
| SCHEMBL316482 | 0.83 | GBA1 (0.65) | GBA1SLC18A3CCR3MGLL | |
| SCHEMBL6398199 | 0.82 | GBA1 (0.55) | GBA1SLC18A3CCR3MGLL | |
| Formic Acid SCHEMBL28223021 | 0.81 | EPHX2 (0.49) | — | |
| SCHEMBL158625 | 0.81 | GBA1 (0.63) | GBA1SLC18A3CCR3MGLL | |
| SCHEMBL8137977 | 0.81 | GBA1 (0.63) | GBA1SLC18A3CCR3MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103923765-A | Detergent Composition For Process Of Manufacturing Semiconductors And Displays | COWON INNOTECH INC | 2014-07-16 | — | — | CN | claimed |
| CN-109054648-A | Serosity combination for chemically mechanical polishing | LTCAM有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-104419326-A | Slurry composition for chemical mechanical polishing | COWON INNOTECH INC | 2015-03-18 | — | — | CN | disclosed |
| CN-103923765-A | Detergent Composition For Process Of Manufacturing Semiconductors And Displays | COWON INNOTECH INC | 2014-07-16 | — | — | CN | disclosed |