SCHEMBL27974686

SCHEMBL27974686

CCC(O)COC.[Ti]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3602748 0.97
SCHEMBL1427480 0.97
SCHEMBL283332 0.97
Isopropyl Alcohol SCHEMBL7596864 0.92 TSHR (0.40)
Cyclopropane SCHEMBL14935774 0.89 MAPT (0.35)
SCHEMBL15249287 0.87 KDM4E (0.43)
SCHEMBL13173427 0.83 MAPT (0.35)
SCHEMBL55052 0.81
SCHEMBL9906569 0.79 HSD17B10 (0.44)
SCHEMBL31145340 0.78 HSD17B10 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105001254-B The manufacturing method of film material, IV family metal oxide films 东曹株式会社 2018-09-11 CN disclosed
CN-105001254-A Manufacturing methods for film-forming material, group IV metal oxide film TOSOH CORP 2015-10-28 CN disclosed
CN-103917487-A Film-forming material, group IV metal oxide film, and vinylidene diamide complex TOSOH CORP 2014-07-09 CN disclosed