Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.37 |
| ▸ | ACHE | P22303 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | CA4 | P22748 | 3/20 | 0.33 |
| ▸ | CA1 | P00915 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 3/20 | 0.33 |
| ▸ | CA9 | Q16790 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | CA12 | O43570 | 2/20 | 0.33 |
| ▸ | CA7 | P43166 | 2/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.33 |
| ▸ | DAO | P14920 | 1/20 | 0.32 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | HTR6 | P50406 | 1/20 | 0.32 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.30 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.30 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2799322 | 1.00 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| SCHEMBL55166 | 0.97 | — | — | |
| Fluoride SCHEMBL27669402 | 0.93 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| Ammonia Solution, Strong SCHEMBL11519580 | 0.93 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| SCHEMBL27876203 | 0.93 | — | — | |
| SCHEMBL16286660 | 0.93 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| Hydrochloric Acid SCHEMBL11803910 | 0.93 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| SCHEMBL14875991 | 0.93 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| SCHEMBL4517726 | 0.93 | TSHR (0.37) | TSHRACHELMNAALOX12CA4 | |
| Dimethylamine SCHEMBL10623601 | 0.88 | TSHR (0.41) | TSHRACHELMNAALOX12ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7749563-B2 | Two-layer film for next generation damascene barrier application with good oxidation resistance | APPLIED MATERIALS, INC. (US) | 2010-07-06 | — | — | US | disclosed |
| US-7319068-B2 | Method of depositing low k barrier layers | APPLIED MATERIALS, INC. (US) | 2008-01-15 | — | — | US | disclosed |
| US-20070042610-A1 | METHOD OF DEPOSITING LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. | 2007-02-22 | — | — | US | disclosed |
| US-7125813-B2 | Method of depositing low K barrier layers | APPLIED MATERIALS, INC. (US) | 2006-10-24 | — | — | US | disclosed |
| US-7049249-B2 | Method of improving stability in low k barrier layers | APPLIED MATERIALS (US) | 2006-05-23 | — | — | US | disclosed |
| EP-1588410-A1 | A METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | Applied Materials, Inc. (US) | 2005-10-26 | — | — | EP | disclosed |
| EP-1558784-A2 | TWO-LAYER FILM FOR NEXT GENERATION DAMASCENE BARRIER APPLICATION WITH GOOD OXIDATION RESISTANCE | Applied Materials, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-20050042858-A1 | Method of improving stability in low k barrier layers | LI LIHUA (US) | 2005-02-24 | — | — | US | disclosed |
| US-20040198070-A1 | Method of depositing low K barrier layers | APPLIED MATERIALS, INC. | 2004-10-07 | — | — | US | disclosed |
| US-6790788-B2 | Method of improving stability in low k barrier layers | APPLIED MATERIALS INC. | 2004-09-14 | — | — | US | disclosed |
| WO-2004064136-A1 | A METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. (US) | 2004-07-29 | — | — | WO | disclosed |
| US-20040137756-A1 | METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. | 2004-07-15 | — | — | US | disclosed |
| US-6759327-B2 | Method of depositing low k barrier layers | APPLIED MATERIALS INC. | 2004-07-06 | — | — | US | disclosed |
| WO-2004033752-A2 | TWO-LAYER FILM FOR NEXT GENERATION DAMASCENE BARRIER APPLICATION WITH GOOD OXIDATION RESISTANCE | APPLIED MATERIALS, INC. (US) | 2004-04-22 | — | — | WO | disclosed |
| US-20040067308-A1 | Two-layer film for next generation damascene barrier application with good oxidation resistance | APPLIED MATERIALS, INC. | 2004-04-08 | — | — | US | disclosed |
| WO-2003043073-A2 | A METHOD OF DEPOSITING LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. (US) | 2003-05-22 | — | — | WO | disclosed |
| US-20030068881-A1 | Method of depositing low k barrier layers | APPLIED MATERIALS, INC. | 2003-04-10 | — | — | US | disclosed |