⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methylamine SCHEMBL27814155 | 0.70 | — | — | |
| SCHEMBL29652160 | 0.70 | — | — | |
| SCHEMBL207623 | 0.67 | — | — | |
| SCHEMBL323331 | 0.67 | — | — | |
| SCHEMBL9551515 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL28904718 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL28032630 | 0.63 | — | — | |
| Fluoride SCHEMBL27919986 | 0.63 | — | — | |
| SCHEMBL1140879 | 0.60 | — | — | |
| SCHEMBL20845275 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11339473-B2 | Apparatus for atomic layer deposition and method of forming thin film using the apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2022-05-24 | — | — | US | disclosed |
| CN-107452924-B | Porous separator for secondary battery and method for producing same | SK新技术株式会社 | 2022-05-17 | — | — | CN | disclosed |
| CN-101809711-B | Apparatus and method for depositing thin film on wafer and method for gap filling trench | IPS LTD | 2012-01-11 | — | — | CN | disclosed |
| CN-101809711-A | Apparatus and method for depositing thin film on wafer and method for gap filling trench | IPS LTD | 2010-08-18 | — | — | CN | disclosed |
| US-20100190341-A1 | APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME | IPS LTD. (KR) | 2010-07-29 | — | — | US | disclosed |
| WO-2009011532-A2 | APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME | IPS LTD. (KR) | 2009-01-22 | — | — | WO | disclosed |