⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL15255089 | 1.00 | TDP1 (0.47) | — | |
| Methacrylic Acid SCHEMBL8059992 | 0.88 | — | — | |
| Methacrylic Acid SCHEMBL2475764 | 0.88 | — | — | |
| Methacrylic Acid SCHEMBL28684667 | 0.84 | TDP1 (0.42) | — | |
| Methacrylic Acid SCHEMBL28908438 | 0.84 | TDP1 (0.42) | — | |
| Methacrylic Acid SCHEMBL897201 | 0.84 | — | — | |
| Methacrylic Acid SCHEMBL2218763 | 0.84 | — | — | |
| Methacrylic Acid SCHEMBL10811501 | 0.83 | TDP1 (0.56) | — | |
| Methacrylic Acid SCHEMBL10588743 | 0.83 | — | — | |
| Methacrylic Acid SCHEMBL3047687 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114163559-A | Nitrogen-containing binary polymer biodiesel pour point depressant and preparation method and application thereof | 上海应用技术大学 | 2022-03-11 | — | — | CN | claimed |
| CN-117402285-A | Polymer additive, negative electrode slurry and lithium ion battery | 上海轩邑新能源发展有限公司 | 2024-01-16 | — | — | CN | disclosed |
| CN-114163559-B | Nitrogen-containing binary polymer biodiesel pour point depressant, and preparation method and application thereof | 上海应用技术大学 | 2023-05-30 | — | — | CN | disclosed |
| CN-115397877-A | Curable resin composition, resin film, cured product, and laminate | 东洋油墨SC控股株式会社 | 2022-11-25 | — | — | CN | disclosed |
| CN-112876625-B | Poly (methyl) acrylate viscosity index improver and preparation method and application thereof | 大连同康新材料科技有限公司 | 2022-09-06 | — | — | CN | disclosed |
| CN-114163559-A | Nitrogen-containing binary polymer biodiesel pour point depressant and preparation method and application thereof | 上海应用技术大学 | 2022-03-11 | — | — | CN | disclosed |
| CN-112876625-A | Poly (methyl) acrylate viscosity index improver and preparation method and application thereof | 大连同康新材料科技有限公司 | 2021-06-01 | — | — | CN | disclosed |
| CN-104698780-B | Liquid developer | 柯尼卡美能达株式会社 | 2019-07-16 | — | — | CN | disclosed |
| CN-104460257-B | Liquid developer | 柯尼卡美能达株式会社 | 2018-11-16 | — | — | CN | disclosed |
| CN-104423192-B | Liquid developer | 柯尼卡美能达株式会社 | 2018-08-28 | — | — | CN | disclosed |
| CN-104714387-A | RESIN COMPOSITION FOR FORMING RECORDING LAYER, RECORDING MEDIUM, AND IMAGE-RECORDED MATERIAL | FUJI XEROX CO LTD | 2015-06-17 | — | — | CN | disclosed |
| CN-104698778-A | LIQUID DEVELOPER | KONICA MINOLTA INC | 2015-06-10 | — | — | CN | disclosed |
| CN-104698780-A | Liquid developer | KONICA MINOLTA INC | 2015-06-10 | — | — | CN | disclosed |
| CN-104460256-A | Liquid developer and image formation method | KONICA MINOLTA INC | 2015-03-25 | — | — | CN | disclosed |
| CN-104460257-A | Liquid developer | KONICA MINOLTA INC | 2015-03-25 | — | — | CN | disclosed |
| CN-104423192-A | LIQUID DEVELOPER | KONICA MINOLTA INC | 2015-03-18 | — | — | CN | disclosed |