SCHEMBL2801741

SCHEMBL2801741

CCCCCPC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL302659 0.97 TSHR (0.53)
SCHEMBL304305 0.97 TSHR (0.53)
SCHEMBL5385031 0.97 TSHR (0.53)
SCHEMBL5384516 0.97 TSHR (0.53)
SCHEMBL302724 0.97
SCHEMBL2804592 0.97
SCHEMBL8820774 0.97 TSHR (0.53)
SCHEMBL13369201 0.97 TSHR (0.53)
SCHEMBL302623 0.97 TSHR (0.53)
SCHEMBL20068118 0.97 TSHR (0.53)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118393811-B Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-09-03 CN disclosed
CN-118393812-B Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-08-30 CN disclosed
CN-118244581-B Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-08-13 CN disclosed
CN-118393811-A Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-07-26 CN disclosed
CN-118393812-A Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-07-26 CN disclosed
CN-118244581-A Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-06-25 CN disclosed
EP-4289275-A1 INSECT REPELLENT COMPOSITION Universität für Bodenkultur Wien (AT) 2023-12-13 EP disclosed
US-20230382983-A1 COMPLEMENT FACTOR D ANTAGONIST ANTIBODIES AND CONJUGATES THEREOF KODIAK SCIENCES INC. 2023-11-30 US disclosed
US-20230324801-A1 UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-12 US disclosed
CN-110121326-A Dental composition 登特斯普伊德特雷有限公司 2019-08-13 CN disclosed
EP-2218725-A1 BRIDGED METALLOCENE COMPOUND, OLEFIN POLYMERIZATION CATALYST USING THE COMPOUND AND ETHYLENE POLYMER OBTAINED BY USING THE CATALYST Mitsui Chemicals, Inc. (JP) 2010-08-18 EP disclosed
US-20070259879-A1 Piperazine and piperidine biaryl derivatives TRIMERIS, INC. 2007-11-08 US disclosed
WO-2007103456-A2 PIPERAZINE AND PIPERIDINE BIARYL DERIVATIVES TRIMERIS, INC. (US) 2007-09-13 WO disclosed
US-7214747-B2 Phosphorus substituted metallocene compounds for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. (US) 2007-05-08 US disclosed
US-20050239980-A1 Phosphorus substituted metallocene compounds for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. 2005-10-27 US disclosed
CN-1589276-A Multimer of acylphosphines and their derivatives CIBA SC HOLDING AG (CH) 2005-03-02 CN disclosed
CN-1125175-C Alkaline protease, method for producing the same, method for using the same, and microorganism producing the same NOVO NORDISK AS (DK) 2003-10-22 CN disclosed
CN-1201489-A Alkaline protease, method for producing the same, method for using the same, and microorganism producing the same NOVO NORDISK AS (DK) 1998-12-09 CN disclosed
WO-1997025334-A1 NOVEL ARYLLITHIUM PRODUCTS AND PROCESSES FMC CORPORATION (US) 1997-07-17 WO disclosed
US-4857658-A Preparation of (Z)-2-(2-arylethenyl)arylcarboxylic acids BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed