SCHEMBL28028306

SCHEMBL28028306

CCC(C1CNCCO1)N(C(N)=O)C(CC)C1CNCCO1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 13/20 0.37
SLC6A4 P31645 12/20 0.34
SLC6A3 Q01959 7/20 0.34
MLNR O43193 1/20 0.34
ADRB2 P07550 1/20 0.34
CHRM2 P08172 1/20 0.34
CHRM1 P11229 1/20 0.34
CHRM3 P20309 1/20 0.34
HTR2C P28335 1/20 0.34
OPRK1 P41145 1/20 0.34
KCNH2 Q12809 1/20 0.34
KDM4E B2RXH2 1/20 0.34
MEN1 O00255 1/20 0.34
ALDH1A1 P00352 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
MAPK1 P28482 1/20 0.34
KMT2A Q03164 1/20 0.34
SSTR4 P31391 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28226607 0.82 SLC6A2 (0.32) SLC6A2
SCHEMBL1030001 0.79 SLC6A2 (0.37) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL27619774 0.78 SLC6A2 (0.36) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL1032528 0.78 SLC6A2 (0.36) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL10883017 0.75 SLC6A2 (0.35) SLC6A2SLC6A4SLC6A3MLNRADRB2
Propionamide SCHEMBL27586347 0.74 SLC6A2 (0.35) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL27125583 0.73 SLC6A2 (0.39) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL9398208 0.72 SLC6A2 (0.37) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL27573223 0.72 SLC6A2 (0.43) SLC6A2SLC6A4SLC6A3MLNRADRB2
SCHEMBL6161529 0.72 SLC6A2 (0.35) SLC6A2SLC6A4SLC6A3MLNRADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104854265-B copper plating bath composition 德国艾托特克公司 2017-08-08 CN disclosed
CN-104854265-A Copper plating bath composition ATOTECH DEUTSCHLAND GMBH 2015-08-19 CN disclosed