SCHEMBL28029068

SCHEMBL28029068

Fc1ccc(-c2ccc[nH]2)c(F)c1[Ti](C1=CC=CC1)c1c(F)ccc(-c2ccc[nH]2)c1F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CDK2 P24941 5/20 0.34
AURKA O14965 1/20 0.30
KDR P35968 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL151579 0.72 CDK2 (0.34) CDK2
SCHEMBL27834760 0.69
SCHEMBL28623525 0.69
SCHEMBL27557815 0.69 CDK2 (0.47) CDK2AURKAKDR
SCHEMBL28624888 0.67
SCHEMBL5862947 0.65 CDK2 (0.44) CDK2AURKAKDR
SCHEMBL31482039 0.65 CDK2 (0.44) CDK2AURKAKDR
SCHEMBL28770372 0.65 CDK2 (0.44) CDK2AURKAKDR
Hydrochloric Acid SCHEMBL30297351 0.64 CDK2 (0.43) CDK2AURKAKDR
SCHEMBL7568875 0.64 CDK2 (0.47) CDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105175315-A Photoresist composition BASF SE 2015-12-23 CN disclosed
CN-102361896-B Photoresist composition BASF SE (DE) 2015-10-07 CN disclosed