SCHEMBL2803264

SCHEMBL2803264

CC(C)(O)COCCOCCO

nearest known ligand 0.55

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
TSHR P16473 2/20 0.50
MAPK1 P28482 1/20 0.50
THRB P10828 1/20 0.43
HTT P42858 1/20 0.43
MAPT P10636 1/20 0.43
ALDH1A1 P00352 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2805801 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL14606164 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL5456660 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL28915215 0.98 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL28889985 0.98 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL28889927 0.98 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL30507677 0.98 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL28915206 0.98 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL30507665 0.98 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL30507684 0.95 MEN1 (0.50) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1272486-B1 METHOD FOR PRODUCING 7-(PYRAZOLE-3-YL) BENZOXAZOLES BASF AG (DE) 2004-08-11 EP claimed
CN-118829706-A Dispersing agent, dispersion and article 第一工业制药株式会社 2024-10-22 CN disclosed
CN-115175783-B Soldering flux and soldering paste 千住金属工业株式会社 2024-09-13 CN disclosed
CN-117795030-A Electro-peelable adhesive composition, electro-peelable adhesive article, and use thereof 维爱吉科技有限公司 2024-03-29 CN disclosed
CN-117795031-A Electro-peelable adhesive composition, electro-peelable adhesive article, and use thereof 维爱吉科技有限公司 2024-03-29 CN disclosed
CN-115322383-B Polytelluroxane and process for producing the same 清华大学 2023-07-25 CN disclosed
CN-115103736-B Soldering flux and soldering paste 千住金属工业株式会社 2023-07-14 CN disclosed
CN-115322383-A Polytelluroxane and preparation method thereof 清华大学 2022-11-11 CN disclosed
CN-115175783-A Flux and solder paste 千住金属工业株式会社 2022-10-11 CN disclosed
CN-115103736-A Flux and solder paste 千住金属工业株式会社 2022-09-23 CN disclosed
US-4677186-A AMINO DICARBOXYLIC ACID MONOMERS, PROTECITVE COATINGS CIBA-GEIGY CORPORATION (US) 1987-06-30 US disclosed
US-4657832-A HOMO-AND COPOLYMERS, OF POLYIMIDES, POLYAMIDES, POLYESTERS AND OTHERS CIBA-GEIGY CORPORATION (US) 1987-04-14 US disclosed
US-4656116-A CROSSLINKABLE SOLUTIONS OF SOLVENT, POLYIMIDE AND POLYAZIDE CHROMOGEN; PHOTORESISTS; PHOTOLITHOGRAPHY CIBA-GEIGY CORPORATION (US) 1987-04-07 US disclosed
US-4656292-A 2,3-dimethylmaleimido-alkyl haloacetates CIBA-GEIGY CORPORATION (US) 1987-04-07 US disclosed
US-4629777-A RADIATION-SENSITIVE, AUTOPHOTOCROSSLINKABLE; FILMS, COATINGS CIBA-GEIGY CORPORATION (US) 1986-12-16 US disclosed
US-4629685-A PROTECTIVE FILMS OR PHOTOGRAPHIC RELIEF IMAGES CIBA-GEIGY CORPORATION (US) 1986-12-16 US disclosed
US-4624912-A EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING CIBA-GEIGY CORPORATION (US) 1986-11-25 US disclosed
US-4601973-A Photopolymerizable coating agent, a photopolymerizable material and its use CIBA-GEIGY CORPORATION (US) 1986-07-22 US disclosed
US-4544621-A Photocrosslinkable water-soluble polymers, containing maleimidyl and quaternary ammonium groups process for their preparation and use thereof CIBA GEIGY CORPORATION (US) 1985-10-01 US disclosed
US-4019965-A Separation of phenol, cyclohexanone, and cyclohexylbenzene containing mixtures employing dialkyl and dicycloalkyl phthalates PHILLIPS PETROLEUM COMPANY (US) 1977-04-26 US disclosed