⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3382303 | 0.79 | TSHR (0.30) | — | |
| SCHEMBL27816493 | 0.77 | — | — | |
| SCHEMBL27816491 | 0.77 | — | — | |
| SCHEMBL27795527 | 0.76 | — | — | |
| SCHEMBL17711185 | 0.69 | — | — | |
| SCHEMBL27795578 | 0.69 | — | — | |
| SCHEMBL3383631 | 0.65 | — | — | |
| SCHEMBL27816494 | 0.65 | — | — | |
| SCHEMBL17711074 | 0.65 | — | — | |
| SCHEMBL25168566 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101886255-A | Use contains the dielectric barrier deposition of nitrogen precursor | AIR PROD & CHEM | 2010-11-17 | — | — | CN | claimed |
| CN-105239055-A | Aminovinylsilane for CVD and ALD SiO2 films | AIR PROD & CHEM | 2016-01-13 | — | — | CN | disclosed |
| CN-102491990-B | Based on the precursor of amino vinylsilane | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-12-09 | — | — | CN | disclosed |
| CN-101899651-A | Aminovinylsilane precursors for stressed SiN films | AIR PROD & CHEM | 2010-12-01 | — | — | CN | disclosed |
| CN-101886255-A | Use contains the dielectric barrier deposition of nitrogen precursor | AIR PROD & CHEM | 2010-11-17 | — | — | CN | disclosed |