SCHEMBL28046024

SCHEMBL28046024

O=[N+]([O-])c1cccc(S(=O)(=O)O)c1Cc1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.48
MEN1 O00255 3/20 0.48
CYP19A1 P11511 1/20 0.48
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
MMP1 P03956 1/20 0.45
MMP2 P08253 1/20 0.45
MMP9 P14780 1/20 0.45
MMP8 P22894 1/20 0.45
MMP13 P45452 1/20 0.45
POLB P06746 1/20 0.44
F2 P00734 2/20 0.42
PRSS1 P07477 2/20 0.42
PRSS2 P07478 2/20 0.42
PRSS3 P35030 2/20 0.42
ALDH1A1 P00352 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14991413 0.89 KMT2A (0.50) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL14991414 0.89 KMT2A (0.50) KMT2AMEN1CYP19A1CA1CA2
Diphenylmethane SCHEMBL9101723 0.86 KMT2A (0.56) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL4690711 0.85 KMT2A (0.48) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL4692666 0.85 KMT2A (0.48) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL16519973 0.82 TDP1 (0.48) KMT2AMEN1CYP19A1ALDH1A1MAPK1
SCHEMBL27558462 0.81 KMT2A (0.49) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL1057139 0.81 KMT2A (0.49) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL1057141 0.81 KMT2A (0.49) KMT2AMEN1CYP19A1CA1CA2
SCHEMBL19126862 0.80 KMT2A (0.47) KMT2AMEN1CYP19A1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104379347-B Display element and manufacture method thereof 第毛织株式会社 2016-11-02 CN disclosed
CN-105713512-A Composition for forming silica-based layer, method for manufacturing silica-based layer, and electronic device 三星SDI株式会社 2016-06-29 CN disclosed
CN-105720041-A Composition for forming silica-based layer, and electronic device 三星SDI株式会社 2016-06-29 CN disclosed
CN-105315679-A Composition for forming silica-based layer and method for manufacturing silica-based layer SAMSUNG SDI CO LTD 2016-02-10 CN disclosed