SCHEMBL28051150

SCHEMBL28051150

C=C(CCCOc1ccccc1)C(=O)Oc1ccccc1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 1/20 0.46
ALDH1A1 P00352 1/20 0.45
MAPT P10636 3/20 0.44
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
HPGD P15428 1/20 0.43
HDAC1 Q13547 2/20 0.43
HDAC2 Q92769 2/20 0.43
KCNA3 P22001 1/20 0.43
TAAR1 Q96RJ0 1/20 0.43
POLB P06746 1/20 0.42
JAK2 O60674 1/20 0.42
LMNA P02545 1/20 0.42
GAA P10253 1/20 0.42
MEN1 O00255 1/20 0.42
ALPL P05186 1/20 0.42
ALPI P09923 1/20 0.42
ALPG P10696 1/20 0.42
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3184460 0.88 KCNA3 (0.48) MAPTNPC1RAB9ASMN1; SMN2HPGD
SCHEMBL1155656 0.82 MEN1 (0.47) ALDH1A1MAPTPOLBJAK2LMNA
SCHEMBL4836971 0.80 GAA (0.55) ALDH1A1MAPTNPC1RAB9ASMN1; SMN2
SCHEMBL28009381 0.80 HPGD (0.55) ALDH1A1MAPTNPC1RAB9ASMN1; SMN2
SCHEMBL28619594 0.80 TSHR (0.48) ALDH1A1MAPTNPC1RAB9ASMN1; SMN2
SCHEMBL15940425 0.80 CYP1A2 (0.50) ALDH1A1NPC1RAB9AHDAC1HDAC2
SCHEMBL15255 0.79 KCNA3 (0.54) ALDH1A1MAPTNPC1RAB9ASMN1; SMN2
SCHEMBL1949303 0.78 GAA (0.43) MAPTSMN1; SMN2POLBJAK2LMNA
SCHEMBL7430087 0.78 TDP1 (0.56) ALDH1A1MAPTNPC1RAB9ASMN1; SMN2
SCHEMBL11243154 0.77 ELANE (0.45) ALDH1A1MAPTHPGDHDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105319850-A Photonasty resin composition DONGWOO FINE CHEM CO LTD 2016-02-10 CN claimed
CN-105319850-B Photosensitive polymer combination 东友精细化工有限公司 2019-10-11 CN disclosed
CN-105319850-A Photonasty resin composition DONGWOO FINE CHEM CO LTD 2016-02-10 CN disclosed