SCHEMBL28054823

SCHEMBL28054823

CCCCCCCCCCc1cc2ccccc2c(S(=O)(=O)O)c1S(=O)(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.47
TLR8 Q9NR97 2/20 0.43
CYP2D6 P10635 1/20 0.43
LIPG Q9Y5X9 1/20 0.42
CYP3A4 P08684 2/20 0.40
KDM4E B2RXH2 1/20 0.40
USP2 O75604 1/20 0.40
ALDH1A1 P00352 1/20 0.40
GLA P06280 1/20 0.40
GAA P10253 1/20 0.40
HPGD P15428 1/20 0.40
CASP1 P29466 1/20 0.40
CASP7 P55210 1/20 0.40
HSD17B10 Q99714 1/20 0.40
SLC2A1 P11166 1/20 0.39
GPR84 Q9NQS5 1/20 0.39
CTSV O60911 1/20 0.38
CTSL P07711 1/20 0.38
MEN1 O00255 1/20 0.38
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7786375 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL2522076 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL150438 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL2522842 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL2049326 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL7787213 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL2521075 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL2522851 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL7784219 1.00 MAPT (0.47) MAPTTLR8CYP2D6LIPGCYP3A4
SCHEMBL2521799 0.99 MAPT (0.45) MAPTTLR8CYP2D6LIPGCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105368452-B Silicon oxide layer etching solution 易安爱富科技有限公司 2019-02-19 CN disclosed
CN-105368452-A Silicon oxide layer etching liquid ENF TECHNOLOGY CO LTD 2016-03-02 CN disclosed