Ethylene

Ethylene

SCHEMBL28061335

C=C.C=COC(=O)C=Cc1ccccc1

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.53
LMNA P02545 3/20 0.53
ALDH1A1 P00352 3/20 0.53
HDAC3 O15379 2/20 0.53
HDAC4 P56524 2/20 0.53
HDAC1 Q13547 2/20 0.53
HDAC2 Q92769 2/20 0.53
HDAC8 Q9BY41 2/20 0.53
HDAC6 Q9UBN7 2/20 0.53
PLIN1 O60240 2/20 0.53
RECQL P46063 2/20 0.53
PLIN5 Q00G26 2/20 0.53
ABHD5 Q8WTS1 2/20 0.53
SMN1; SMN2 Q16637 2/20 0.53
TNKS O95271 1/20 0.53
HCAR2 Q8TDS4 1/20 0.53
HDAC7 Q8WUI4 1/20 0.53
HDAC10 Q969S8 1/20 0.53
HDAC11 Q96DB2 1/20 0.53
TNKS2 Q9H2K2 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL28061334 1.00 MAPT (0.53) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL312613 0.98 MAPT (0.55) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL312612 0.98 MAPT (0.55) MAPTLMNAALDH1A1HDAC3HDAC4
Acetic Acid SCHEMBL28099305 0.93 GLA (0.56) MAPTLMNAALDH1A1HDAC3HDAC4
Acetic Acid SCHEMBL27756791 0.93 GLA (0.56) MAPTLMNAALDH1A1HDAC3HDAC4
Propene SCHEMBL28169113 0.93 GLA (0.52) MAPTLMNAALDH1A1HDAC3HDAC4
Propene SCHEMBL28169115 0.93 GLA (0.52) MAPTLMNAALDH1A1HDAC3HDAC4
Chloromethane SCHEMBL27573509 0.93 GLA (0.52) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL28215688 0.91 GLA (0.50) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL28215687 0.91 GLA (0.55) MAPTLMNAALDH1A1HDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108779196-A Method for producing polymer, method for producing negative photosensitive resin composition, method for producing resin film, method for producing electronic device, and polymer 住友电木株式会社 2018-11-09 CN disclosed
CN-103228736-B Curable composition 株式会社钟化 2017-05-03 CN disclosed
CN-104350084-B There is the polymer of the end structure having multiple reactive silicon and manufacture method thereof and utilization 株式会社钟化 2016-10-12 CN disclosed
CN-103814101-B Curable composition and cured product thereof 株式会社钟化 2016-08-17 CN disclosed