⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9093617 | 0.93 | MEN1 (0.86) | — | |
| SCHEMBL31709992 | 0.93 | MEN1 (0.86) | — | |
| SCHEMBL136652 | 0.93 | — | — | |
| SCHEMBL14916717 | 0.93 | MEN1 (0.86) | — | |
| SCHEMBL23398193 | 0.86 | MEN1 (0.75) | — | |
| SCHEMBL344814 | 0.86 | MEN1 (0.75) | — | |
| SCHEMBL1772332 | 0.86 | MEN1 (0.75) | — | |
| SCHEMBL3899631 | 0.86 | MEN1 (0.75) | — | |
| SCHEMBL11659685 | 0.86 | — | — | |
| Strontium Nitrate SCHEMBL35829 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114806563-B | Fluorescent powder capable of promoting plant growth and preparation and application thereof | 兰州大学 | 2023-04-25 | — | — | CN | claimed |
| WO-2022218431-A1 | FLUORESCENT POWDER CAPABLE OF PROMOTING PLANT GROWTH, AND PREPARATION METHOD AND USE THEREFOR | 兰州大学 | 2022-10-20 | — | — | WO | claimed |
| CN-114806563-A | Fluorescent powder capable of promoting plant growth and preparation and application thereof | 兰州大学 | 2022-07-29 | — | — | CN | claimed |
| CN-114748986-A | Synchronous defluorination and denitration method for composite absorbent | 昆明理工大学 | 2022-07-15 | — | — | CN | claimed |
| CN-101993755-A | Methods for removing impurities from coal including neutralization of leaching solution | GEN ELECTRIC | 2011-03-30 | — | — | CN | claimed |
| US-20100320428-A1 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2010-12-23 | — | — | US | claimed |
| EP-2145030-A2 | METHOD FOR LOW TEMPERATURE THERMAL CLEANING | L'air Liquide-societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude (FR) | 2010-01-20 | — | — | EP | claimed |
| EP-2097909-A2 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | Honeywell International Inc. (US) | 2009-09-09 | — | — | EP | claimed |
| US-20080236482-A1 | METHOD FOR LOW TEMPERATURE THERMAL CLEANING | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2008-10-02 | — | — | US | claimed |
| WO-2008117258-A2 | METHOD FOR LOW TEMPERATURE THERMAL CLEANING | L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) | 2008-10-02 | — | — | WO | claimed |
| US-20080236483-A1 | METHOD FOR LOW TEMPERATURE THERMAL CLEANING | L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2008-10-02 | — | — | US | claimed |
| US-20080142039-A1 | REMOVAL OF NITRIDE DEPOSITS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-06-19 | — | — | US | claimed |
| WO-2008073790-A2 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2008-06-19 | — | — | WO | claimed |
| US-20080135817-A1 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. | 2008-06-12 | — | — | US | claimed |
| US-7332399-B2 | Method for manufacturing a semiconductor substrate and method for manufacturing a semiconductor in which film thicknesses can be accurately controlled | SEIKO EPSON CORPORATION (JP) | 2008-02-19 | — | — | US | claimed |
| US-20070034937-A1 | Semiconductor device and a method of manufacturing the same | RENESAS TECHNOLOGY CORP. | 2007-02-15 | — | — | US | claimed |
| US-20050255678-A1 | Method for manufacturing semiconductor substrate and method for manufacturing semiconductor device | SEIKO EPSON CORPORATION (JP) | 2005-11-17 | — | — | US | claimed |
| JP-56156800-A | — | — | None | — | — | JP | disclosed |
| US-4147731-A | SOLVENT EXTRACTION | ROCKWELL INTERNATIONAL CORPORATION (US) | 1979-04-03 | — | — | US | disclosed |
| US-3968158-A | FROM FLUORINE AND GUANIDINE OR SALTS | ROHM AND HAAS COMPANY (US) | 1976-07-06 | — | — | US | disclosed |