SCHEMBL28078047

SCHEMBL28078047

C1CCN(CCN2CCNCC2)C1.C1CCN(CCN2CCNCC2)CC1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR4 P61073 6/20 0.60
HRH3 Q9Y5N1 2/20 0.50
POLB P06746 2/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
RAD52 P43351 1/20 0.50
HSD17B10 Q99714 1/20 0.43
MEN1 O00255 1/20 0.42
CHRM2 P08172 1/20 0.42
CHRM1 P11229 1/20 0.42
ADRA2C P18825 1/20 0.42
CCR2 P41597 1/20 0.42
CXCL12 P48061 1/20 0.42
BLM P54132 1/20 0.42
KMT2A Q03164 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CA2 P00918 1/20 0.41
CHKA P35790 1/20 0.41
ALDH1A1 P00352 1/20 0.41
MAPT P10636 1/20 0.41
KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1914465 1.00 CXCR4 (0.60) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL6913246 1.00 CXCR4 (0.60) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL946201 0.97 CXCR4 (0.62) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL13661067 0.95 CXCR4 (0.68) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL12992865 0.92 CXCR4 (0.62) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL6644934 0.90 CXCR4 (0.72) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL152651 0.90 CXCR4 (0.75) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL23337601 0.89 CXCR4 (0.74) CXCR4HRH3POLBSMN1; SMN2RAD52
Hydrochloric Acid SCHEMBL3068935 0.89 CXCR4 (0.60) CXCR4HRH3POLBSMN1; SMN2RAD52
SCHEMBL5573157 0.89 CXCR4 (0.74) CXCR4HRH3POLBSMN1; SMN2RAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104046246-B The chemical-mechanical planarization of tungsten-containing substrate 气体产品与化学公司 2016-06-15 CN disclosed