SCHEMBL28080200

SCHEMBL28080200

CC(C)(C)C(=O)CC(=O)C(C)(C)C.O=[Ti]

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.36
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
HSD11B1 P28845 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
HMGCR P04035 1/20 0.30
CHRM1 P11229 1/20 0.30
TBXA2R P21731 1/20 0.30
ADRA1A P35348 1/20 0.30
MAPK1 P28482 1/20 0.30
ALDH1A1 P00352 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL93393 0.93 KMT2A (0.39) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL4837194 0.93 KMT2A (0.39) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL7141290 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL9325238 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL16712161 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL9566006 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL4778005 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL15788938 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL21002308 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1
SCHEMBL21405194 0.90 KMT2A (0.37) KMT2ANPC1RAB9AHSD11B1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107850844-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2018-03-27 CN disclosed
CN-103718111-B The photoetching film-forming composition of titaniferous and silicon 日产化学工业株式会社 2017-06-23 CN disclosed
CN-105814144-A Method of depositing abradable coatings under polymer gels 通用电气公司 2016-07-27 CN disclosed
CN-102026826-B Process for producing modified conjugated diene polymer, and rubber composition and tire each produced using same BRIDGESTONE CORP 2015-01-14 CN disclosed
CN-102448739-B Tire BRIDGESTONE CORP 2014-11-26 CN disclosed
CN-102083889-B Process for production of modified conjugated diene copolymer, modified conjugated diene copolymer produced by the process, rubber composition, and tire BRIDGESTONE CORP 2014-08-13 CN disclosed
CN-101528814-B Method for producing modified conjugated diene polymer, modified conjugated diene polymer obtained by the method, rubber composition, and tire BRIDGESTONE CORP 2013-01-09 CN disclosed
CN-102448739-A Tire BRIDGESTONE CORP 2012-05-09 CN disclosed
CN-102083889-A Process for production of modified conjugated diene copolymer, modified conjugated diene copolymer produced by the process, rubber composition, and tire BRIDGESTONE CORP 2011-06-01 CN disclosed
CN-102026826-A Process for producing modified conjugated diene polymer, and rubber composition and tire each produced using same BRIDGESTONE CORP 2011-04-20 CN disclosed
CN-101910279-A Tire BRIDGESTONE CORP 2010-12-08 CN disclosed
CN-101889050-A Tire BRIDGESTONE CORP 2010-11-17 CN disclosed
CN-101528814-A Method for producing modified conjugated diene polymer, modified conjugated diene polymer obtained by the method, rubber composition, and tire BRIDGESTONE CORP (JP) 2009-09-09 CN disclosed