SCHEMBL28085552

SCHEMBL28085552

COC(=O)CCCCC(C)OC

nearest known ligand 0.56

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.56
L3MBTL1 Q9Y468 1/20 0.47
LMNA P02545 4/20 0.46
ALDH1A1 P00352 1/20 0.46
PABPC1 P11940 1/20 0.41
APOBEC3A P31941 1/20 0.41
APOBEC3G Q9HC16 1/20 0.41
RECQL P46063 1/20 0.41
KMT2A Q03164 2/20 0.39
PPARG P37231 1/20 0.38
FAAH O00519 4/20 0.38
CNR1 P21554 1/20 0.38
CNR2 P34972 1/20 0.38
MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16150959 0.85 TSHR (0.55) TSHRL3MBTL1LMNAALDH1A1RECQL
SCHEMBL995832 0.83 TSHR (0.61) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL21279986 0.81 TSHR (0.48) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL17053635 0.81 TSHR (0.48) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL2254699 0.81 TSHR (0.58) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL19281389 0.81 TSHR (0.58) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL4530697 0.81 TSHR (0.58) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL5056126 0.81 TSHR (0.58) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL10081322 0.81 TSHR (0.58) TSHRL3MBTL1LMNAALDH1A1PABPC1
SCHEMBL19281377 0.81 TSHR (0.58) TSHRL3MBTL1LMNAALDH1A1PABPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103885293-B Photosensitive polymer combination and the insulating layer being made from it 东友精细化工有限公司 2019-10-01 CN disclosed
CN-108863732-A Fluorenes based compound containing vinyl 东京应化工业株式会社 2018-11-23 CN disclosed
CN-108780279-A Include the difference of height substrate coating composition of the compound with the photo-crosslinking base based on the unsaturated bond between carbon atom 日产化学株式会社 2018-11-09 CN disclosed
CN-107636536-A Resin composition and display device including black bank manufactured by using the same 株式会社LG化学 2018-01-26 CN disclosed
CN-107561859-A Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2018-01-09 CN disclosed
CN-102645845-B Photosensitive polymer combination, colour filter and display device using the photosensitive polymer combination 东京应化工业株式会社 2018-01-05 CN disclosed
CN-107209460-A Photoetching comprising the hydrolysable silanes with carbonic ester skeleton is with resist lower membrane formation composition 日产化学工业株式会社 2017-09-26 CN disclosed
CN-106933032-A Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2017-07-07 CN disclosed
CN-106406025-A Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2017-02-15 CN disclosed
CN-103764625-B Novel compound 东京应化工业株式会社 2016-08-17 CN disclosed
CN-105867068-A Blue photosensitive resin composition for color filter and application thereof 奇美实业股份有限公司 2016-08-17 CN disclosed