⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2741164 | 0.90 | — | — | |
| SCHEMBL16168125 | 0.85 | — | — | |
| SCHEMBL16168126 | 0.85 | — | — | |
| SCHEMBL25894868 | 0.84 | — | — | |
| SCHEMBL12969892 | 0.83 | — | — | |
| SCHEMBL15281549 | 0.82 | — | — | |
| SCHEMBL15281558 | 0.82 | — | — | |
| SCHEMBL14865668 | 0.82 | — | — | |
| SCHEMBL15281551 | 0.81 | — | — | |
| SCHEMBL775914 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859194-B2 | Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process | DONGJIN SEMICHEM CO., LTD. (KR) | 2014-10-14 | — | — | US | disclosed |
| US-20130252170-A1 | Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process | DONGJIN SEMICHEM CO., LTD. (KR) | 2013-09-26 | — | — | US | disclosed |
| US-20120003589-A1 | POLYMER FOR FORMING RESIST PROTECTION FILM, COMPOSITION FOR FORMING RESIST PROTECTION FILM, AND METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICES USING THE COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-01-05 | — | — | US | disclosed |