SCHEMBL2809733

SCHEMBL2809733

[H+].[H+].[NaH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL924318 1.00
SCHEMBL21957468 1.00
SCHEMBL27888277 1.00
SCHEMBL482585 1.00
SCHEMBL5666439 1.00
SCHEMBL28118671 1.00
SCHEMBL27312960 1.00
Phosphine SCHEMBL23673278 0.82
Water SCHEMBL20582589 0.82
Water SCHEMBL22497643 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107935895-B Compound and its preparation method and application TSINGHUA UNIVERSITY (CN) 2019-10-29 CN claimed
EP-3394613-A1 METHOD FOR PREDICTING THE BIOAVAILABILITY OF A RADIOELEMENT FOLLOWING CONTAMINATION, AND USES THEREOF Commissariat à l'Energie Atomique et aux Energies Alternatives (FR) 2018-10-31 EP claimed
CN-107935895-A Compound and its preparation method and application 清华大学 2018-04-20 CN claimed
CN-107557880-A A kind of preparation method of antiallergy face liber 唐卫兵 2018-01-09 CN claimed
JP-57192952-A None JP disclosed
CN-113336806-A Preparation method of glucosamine organic acid salt 江苏海飞生物科技有限公司 2021-09-03 CN disclosed
WO-2021145004-A1 5α-REDUCTASE INHIBITOR オリザ油化株式会社 2021-07-22 WO disclosed
WO-2021107125-A1 COMPOUND HAVING LYSOPHOSPHATIDIC ACID RECEPTOR AGONISTIC ACTIVITY AND PHARMACEUTICAL USE OF SAID COMPOUND 小野薬品工業株式会社 2021-06-03 WO disclosed
WO-2021079617-A1 GLYCOSIDE COMPOUND, AMIDITE COMPOUND, AND PRODUCTION METHOD FOR POLYNUCLEOTIDE USING SAID COMPOUNDS 住友化学株式会社 2021-04-29 WO disclosed
WO-2021065225-A1 POLISHING COMPOSITION 株式会社フジミインコーポレーテッド 2021-04-08 WO disclosed
WO-2021060395-A1 SUSTAINED-RELEASE PHARMACEUTICAL COMPOSITION 持田製薬株式会社 2021-04-01 WO disclosed
WO-2021060341-A1 USE OF DNMT INHIBITOR 大原薬品工業株式会社 2021-04-01 WO disclosed
EP-1300725-A2 Method of producing thermal-developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2003-04-09 EP disclosed
US-20030031860-A1 Hydrophilic film formed on a metallic base with a roughened surface, and heat conductivity of .05-.5 W/(m middle-dot K) in the direction of its thickness FUJI PHOTO FILM CO., LTD. 2003-02-13 US disclosed
EP-1247644-A2 Support for lithographic printing plate and original forme for lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-09 EP disclosed
US-5624846-A Continuous flow analyzing method and apparatus MITSUBISHI MATERIALS CORPORATION (JP) 1997-04-29 US disclosed
US-4701413-A CULTURING ADENINE-REQUIRING, ANTI FOLATE RESISTANT MUTANT BACILLUS; EFFICIENCY TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1987-10-20 US disclosed
JP-S57192952-A COMPOSITION OF DEVELOPING SOLUTION KONISHIROKU PHOTO IND CO LTD 1982-11-27 JP disclosed
US-4125628-A FORMALDEHYDE, QUATERNARY AMMONIUM SALT VINELAND LABORATORIES, INC. (US) 1978-11-14 US disclosed
US-4022911-A Disinfectant composition comprising a quaternary ammonium compound, a phenol, and formaldehyde DAMON CORPORATION (US) 1977-05-10 US disclosed