⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbamic Acid SCHEMBL30888266 | 0.90 | — | — | |
| Bicarbonate SCHEMBL166976 | 0.83 | — | — | |
| Acetic Acid SCHEMBL30792355 | 0.80 | — | — | |
| SCHEMBL28575127 | 0.79 | — | — | |
| Methylamine SCHEMBL4457035 | 0.78 | — | — | |
| SCHEMBL3343 | 0.78 | — | — | |
| SCHEMBL9521856 | 0.78 | — | — | |
| Butanone SCHEMBL11789045 | 0.78 | — | — | |
| SCHEMBL600739 | 0.78 | — | — | |
| Urea SCHEMBL9065695 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106133601-A | Sensitized ray or the manufacture method of radiation-sensitive resin composition, sensitized ray or radiation-sensitive resin composition, sensitized ray or radioactivity-sensitive film, possess sensitized ray or the blank mask of radioactivity-sensitive film, photomask, pattern formation method, the manufacture method of electronic device and electronic device | 富士胶片株式会社 | 2016-11-16 | — | — | CN | disclosed |
| CN-106061251-A | Herbicidal composition, process for its preparation and its use | 江苏龙灯化学有限公司 | 2016-10-26 | — | — | CN | disclosed |