SCHEMBL28107207

SCHEMBL28107207

N=C=O.O=C=NC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1669939 0.90
Bromide SCHEMBL11784068 0.87
Hydrochloric Acid SCHEMBL5693222 0.87
SCHEMBL28318648 0.78
SCHEMBL28858823 0.73
SCHEMBL462349 0.73
Bicarbonate SCHEMBL6656678 0.71
Bicarbonate SCHEMBL10643251 0.71 CA1 (0.50)
Bicarbonate SCHEMBL9442769 0.71 CA1 (0.50)
SCHEMBL22654770 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108368190-A Photocurable resin composition, display element sealant, liquid crystal display panel, and method for producing same 三井化学株式会社 2018-08-03 CN disclosed
CN-107436535-A Photosensitive polymer combination, dry film, solidfied material and printed circuit board (PCB) 太阳油墨制造株式会社 2017-12-05 CN disclosed
CN-104428712-B Photocurable resin composition, its solidfied material and printed circuit board (PCB) 太阳油墨制造株式会社 2016-10-19 CN disclosed